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Liquid recovery device for a developing machine and developing machine including the device

A technology of liquid recovery and developing machine, which is applied in semiconductor/solid-state device manufacturing, electrical components, circuits, etc., and can solve problems such as the decrease of the reactive concentration of TMAH

Inactive Publication Date: 2012-02-01
AU OPTRONICS CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0008] This neutralization reaction will cause the reactive concentration of TMAH to decrease, which will lead to the aforementioned problems

Method used

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  • Liquid recovery device for a developing machine and developing machine including the device

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Embodiment Construction

[0026] Reference is next made to Figure 2B. After the substrate 201 leaves the coating area 207, the developing machine enters an idle state, and the liquid recovery device will perform a liquid recovery procedure. When carrying out the procedure of liquid recovery, the driving device will drive the liquid container to a first position (such as the position where the liquid container is located in Figure 2B) to stay, so as to accept the liquid flowing out from the liquid dispensing device 209, and make the liquid pass through a guide The device (preferably a closed flow guiding device) flows to the liquid recovery tank 211, that is, the first position is a position capable of receiving the liquid flowing out from the liquid dispensing device. When the liquid container is at the first position, it is preferable to connect the liquid container with the liquid dispensing device 209 and form a closed space, which can further reduce the chance of the liquid contacting the atmospher...

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Abstract

The invention discloses a liquid recovery device for a developing machine and a developing machine including the device, wherein the developing machine includes a liquid dispensing device and a conveying device, and the conveying device moves a substrate along a direction Transporting and entering a coating area, so that the liquid dispensed by the liquid dispensing device is evenly distributed on a surface of the substrate; the liquid recovery device includes: a liquid container and a driving device, which are installed on the One side of the liquid container is used to drive the liquid container to a first position to receive the dispensed liquid.

Description

technical field [0001] The invention relates to a liquid recovery device for a developing machine, in particular to a liquid recovery device that prevents a large amount of contact between the developer and the air, and can be applied to equipment that requires a development process, especially thin-film transistors (thin-film transistors). transistor, TFT) process equipment. Background technique [0002] In order to achieve the miniaturization of components, the industry often uses developing processes to manufacture components, such as electronic components in the electronics industry, micromachines in the mechanical industry, thin-film transistors in the display industry, and so on. Briefly speaking, the development process first uniformly coats a suitable liquid on a workpiece (such as a substrate), then bakes and exposes the substrate, and performs subsequent procedures. [0003] figure 1 Shown is a schematic diagram of a coating area of ​​a developing machine in the ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/32G03F7/26H01L21/67
Inventor 倪仲远吴昌桦
Owner AU OPTRONICS CORP