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Vacuum processing device, diagnostic method for static electricity chuck and storing medium

A technology of vacuum processing device and electrostatic chuck, which is applied to positioning devices, circuits, electrical components, etc., can solve problems such as electrostatic damage and achieve the effect of preventing damage

Inactive Publication Date: 2008-02-13
TOKYO ELECTRON LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, electrostatic chucks in which the dielectric layer is prone to dielectric breakdown due to moisture absorption may cause electrostatic breakdown when a chuck voltage is applied to the chuck electrodes, so the above-mentioned problems cannot be solved.

Method used

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  • Vacuum processing device, diagnostic method for static electricity chuck and storing medium
  • Vacuum processing device, diagnostic method for static electricity chuck and storing medium
  • Vacuum processing device, diagnostic method for static electricity chuck and storing medium

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Embodiment Construction

[0091] An embodiment in which the vacuum processing apparatus of the present invention is applied to a plasma processing apparatus for etching a glass substrate for a liquid crystal display will be described with reference to FIGS. 1 to 3 . FIG. 1 is an example of a plasma processing apparatus 1 . For example, the plasma processing apparatus 1 has a processing container 11 composed of a vacuum container whose interior is a sealed space, an antenna container 51 provided on the upper part of the processing container 11, and a gas shower provided between the processing container 11 and the antenna container 51. The head 41 is the mounting table 2 arranged to face the gas shower head 41 at the center of the bottom surface of the processing chamber 11 .

[0092] A mounting table 2 and a hollow support 16 supporting the mounting table 2 and containing piping and the like are housed in the processing container 11 , and an exhaust device 13 including a vacuum pump and the like is conn...

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Abstract

The invention provides a vacuum treatment device, which can diagnose the insulated state of the dielectric layer when operating the vacuum treatment to the substrate before using the electrostatic chuck. A high-voltage power source applies a DC voltage, i.e. diagnosis voltage lower than the voltage absorbing and maintaining the glass substrate (G) to a chuck electrode of the electrostatic chuck. Each measurer gets the measuring data of the electric characteristics (voltage and current) of respective measuring position. Thereby, the control portion of the diagnosis portion compares the measuring data of the electric characteristics with the predetermined data (threshold) aiming at the electric characteristics and diagnoses whether the electrostatic chuck exceeds the available state.

Description

technical field [0001] The present invention relates to a technique for diagnosing whether or not an electrostatic chuck provided in an apparatus for performing vacuum processing such as plasma processing on a substrate, such as a glass substrate of a flat panel display (FPD), when the operation of the apparatus is started. Background technique [0002] When forming a plurality of thin film transistors (Thin Film Transistor: TFT) on a glass substrate, the process of manufacturing a liquid crystal display which is one type of FPD includes a process of performing plasma treatment such as CVD or etching on the glass substrate. [0003] In the plasma processing step, a plasma processing apparatus is generally used, which arranges a pair of parallel plate-shaped electrodes facing up and down in a vacuum processing container (vacuum container), and applies high-frequency power between these electrodes to make the The processing gas introduced into the device is plasma-treated, and...

Claims

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Application Information

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IPC IPC(8): H01L21/00H01L21/67H01L21/683C23C16/458B23Q3/15
CPCG02F1/1303H01L21/02252H01L21/6831H01L2224/8009
Inventor 古屋敦城里吉务
Owner TOKYO ELECTRON LTD
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