Optical non-linear method for measuring material based on 4f phase coherent imaging system

An optical nonlinear and imaging system technology, which is applied in the measurement field of photonic nonlinear materials, can solve the problems of inability to measure optical nonlinear refraction of materials and different numerical simulation results, and achieve fast test speed, simple optical path and accurate test results Effect

Active Publication Date: 2008-09-10
SUZHOU MICRONANO LASER PHOTON TECH CO LTD
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Problems solved by technology

[0010] However, when the spatial distribution of laser pulses is unstable, due to the instability of the spatial distribution between pulses, the spatial distribution of the nonlinear spot and the linear spot obtained by different pulses on the incident surface may be significantly different. At this time, if you continue to use the linear spot as the input, the numerical simulation results will be different from the experimental measurement results.
Therefore, the existing 4f phase coherent imaging system cannot effectively measure the optical nonlinear refraction of materials when the spot distribution is unstable

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  • Optical non-linear method for measuring material based on 4f phase coherent imaging system
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  • Optical non-linear method for measuring material based on 4f phase coherent imaging system

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Embodiment 1

[0030] Embodiment one: see attached figure 1 To attach Figure 5 Shown, a method based on the 4f phase coherent imaging system to measure the optical nonlinearity of materials.

[0031] as attached figure 1 As shown, the experimental setup applied to the 4f phase coherent imaging system under the condition of unstable spot distribution can be divided into three parts: the beam expander system, the measurement system and the reference system. The beam expander system is composed of a convex lens 1 and a convex lens 2; the measurement system is composed of a phase diaphragm 4, a convex lens 6, a sample to be measured 7, a convex lens 8, a neutral attenuator 9 and a CCD camera 10; the reference system is composed of a beam splitter 5, Reflector 11, convex lens 12, convex lens 13, neutral attenuation sheet 14, reflector 15, reflector 16 and CCD camera 10 are composed.

[0032] Wherein the neutral attenuation sheet 9 and the neutral attenuation sheet 14 are used to keep the CCD ca...

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Abstract

The invention discloses an optical nonlinear method which is based on the measuring materials of a 4f phase and coherent imaging system. The 4f phase and coherent imaging system divides incident laser into two beams through a beam splitting prism; wherein, one beam comes into a measure optical path as a probe light and is collected by a CCD camera after passing 4f system and the other beam is a reference light and is collected by the same CCD camera after coming into a reference light path; samples are arranged at a Fourier plane of the 4f system of the measure optical path. The invention is characterized in that the reference light path is the 4f system; and the outgoing direction of the reference light path and the outgoing direction of the measure optical path are parallel. The improvement of the reference light path leads the invention to get the distribution situation of an incident pulse space on the incident plane at the same time of getting pulsed laser energy on the samples and to measure the nonlinear refractive index under the condition of the unstable spatial distribution of light spots with the simple optical path, the quick testing speed, the accurate results and the convenient data processing.

Description

technical field [0001] The invention relates to a measurement method of photonics nonlinear materials, in particular to a method based on a 4f phase coherent imaging system that can measure the nonlinearity of optical materials under the condition of laser spot distribution and unstable energy, belonging to nonlinear photonics materials and nonlinear optical information processing. Background technique [0002] With the rapid development of optical communication and optical information processing and other fields, the research of nonlinear optical materials is becoming more and more important. The realization of functions such as optical logic, optical memory, optical transistor, optical switch and phase complex conjugation mainly depends on the research progress of nonlinear optical materials. Optical nonlinear measurement technology is one of the key technologies to study nonlinear photonic materials. [0003] The 4f phase coherent imaging system (G.Boudebs and S.Cheruku...

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01N21/45
Inventor 宋瑛林李云波王煜杨俊义王玉晓
Owner SUZHOU MICRONANO LASER PHOTON TECH CO LTD
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