Rectification column for removing hydrogen containing foreign matter in germanic chloride

A technology of germanium tetrachloride and rectification tower, which is applied in the field of rectification tower for removing CH and HCl impurities, can solve the problems of high equipment requirements, complicated operation, inability to effectively remove hydrogen-containing impurities, etc., and achieve simple structure and easy High operation and impurity removal efficiency

Active Publication Date: 2008-09-24
云南驰宏国际锗业有限公司 +1
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] The current conventional distillation tower can remove metal impurities such as Fe, Co, Cr, Mn, Cu, etc., but cannot effectively remove hydrogen-containing impurities (such as CH, HCl)
Using hydrogen chloride gas or anhydrous chlorine alone to purify germanium tetrachloride can only remove arsenic and other similar impurities, but cannot effectively remove hydrogen-containing impurities; although high-temperature devices can be used to process tetrachloride at high temperatures above 800 ° Germanium, so that the hydrogen atoms in it are chlorinated by chlorine to hydrogen chloride, and finally the removal of hydrogen-containing impurities is achieved, but this process has very high requirements for equipment and complicated operation

Method used

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  • Rectification column for removing hydrogen containing foreign matter in germanic chloride

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Embodiment

[0013] Embodiment: the rectifying tower is made of the tower kettle 1 at the bottom, the tower head 3 of the top and the middle tower tube 2 connecting tower kettle 1 and tower head 3, and a heating pipe 8 and an ultraviolet emitter 7 are arranged in the tower kettle 1. A feed port 4 and a gas supply port 5 are left at the top of the tower kettle 1, a temperature monitoring port 6 is opened at the side of the tower kettle 1, and a waste discharge port 9 is opened at the bottom of the tower kettle 1.

[0014] The tower head 3 is provided with a spiral water pipe 16, a cooling water inlet 10 and a cooling water outlet 11. There is an exhaust gas outlet 12 at the highest point of the tower head 3, and a liquid collection pipe 14 is connected to the lower right part of the tower head 3. The liquid collection pipe 14 and the tail gas outlet 12 are formed by The tail gas residual liquid return pipe 13 is connected, and the bottom of the liquid collecting pipe 14 is connected with a s...

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Abstract

The invention relates to a distillation column eliminating the CH impurity and the HCI impurity in germanium tetrachloride for optical fibers, and the distillation column is mainly used for solving the problem for eliminating the CH impurity and the HCI impurity in the germanium tetrachloride, and the distillation column belongs to the field of special equipment. The distillation column is mainly composed of a column reactor, a column pipe and a column head. The column head is provided with a spiral cooling pipe, a cooling water inlet and a cooling water outlet, and the top of the column head is provided with a gas exit. A pipeline which is linked with a swinging head discharging port is arranged on the gas exit, and the lower part is pumped in the bottom of the column head. The bottom of the swinging head discharging port is provided with the pipeline to be pumped in the upper part of the column pipe, and the column reactor is provided with a feed port, a gas supply port, a temperature monitoring port and a waste discharge port.

Description

technical field [0001] The invention relates to a rectification tower for removing hydrogen-containing impurities in germanium tetrachloride in the production of germanium tetrachloride products for optical fibers, especially a rectification tower for removing CH and HCl impurities. It belongs to the field of special equipment. Background technique [0002] The current conventional distillation tower can remove metal impurities such as Fe, Co, Cr, Mn, Cu, etc., but cannot effectively remove hydrogen-containing impurities (such as CH, HCl). Using hydrogen chloride gas or anhydrous chlorine alone to purify germanium tetrachloride can only remove arsenic and other similar impurities, but cannot effectively remove hydrogen-containing impurities; although high-temperature devices can be used to process tetrachloride at high temperatures above 800 ° germanium, the hydrogen atoms in it are chlorinated by chlorine gas to hydrogen chloride, and finally the removal of hydrogen-contai...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C01G17/04
Inventor 周廷熙王少龙钟文晏勇彭明清阎建英王瑞山冯玉庭张文金张院萍杨光玉赵华汪世银李恒方
Owner 云南驰宏国际锗业有限公司
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