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Exposure apparatus, exposure method, and method for manufacturing display panel substrate

A technology of exposure device and exposure method, which is applied in the direction of exposure device for photo-plate-making process, photo-plate-making process for pattern surface, micro-lithography exposure equipment, etc., to achieve the effect of high-precision positioning

Inactive Publication Date: 2009-02-04
HITACHI HIGH-TECH CORP
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0010] Another object of the present invention is to provide a new method for manufacturing a display panel substrate. The technical problem to be solved is to manufacture a high-quality substrate by exposing a pattern with high precision, which is more suitable for practical use.

Method used

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  • Exposure apparatus, exposure method, and method for manufacturing display panel substrate
  • Exposure apparatus, exposure method, and method for manufacturing display panel substrate
  • Exposure apparatus, exposure method, and method for manufacturing display panel substrate

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Embodiment Construction

[0062] In order to further explain the technical means and effects of the present invention to achieve the intended purpose of the invention, the exposure device, the exposure method and the manufacturing method of the panel substrate for display according to the present invention are described in detail below in conjunction with the accompanying drawings and preferred embodiments. Embodiments, structures, methods, steps, features and effects thereof are described in detail below.

[0063] FIG. 1 is a diagram showing a schematic configuration of an exposure apparatus according to an embodiment of the present invention. The exposure device includes a plurality of chucks 10a and 10b, a main platform base 11, a plurality of sub-platform bases 11a and 11b, a pedestal 12, an X guide rail 13, a plurality of moving platforms, a mask frame 20, a laser length measuring system control device 30, Multiple first laser length measuring systems, second laser length measuring systems, laser ...

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Abstract

In exposure in an approximate method by using a plurality of mobile states, a laser distance-to-coupling measurement device is used, to perform position of the sustrate in exposure with high precision. The movable stages carry chucks 10a and 10b and move towards secondary stage bases 11a and 11b and a primary stage base 11, thereby positioning the substrate 1 on the primary stage base 11. Each first laser length-measuring system includes laser sources 31a and 31b, bar mirrors 34a and 34b mounted below X stages 14 of the movable stages, and laser interferometers 32a and 32b disposed at positions deviated from X guide rails 13 on the primary stage base 11, so as to detect positions of the movable stages in X direction. The laser interferometers 32a and 32b will not be influenced by the vibration of the secondary stage bases 11a and 11b. Meanwhile, the measuring distance from the laser interferometers 32a and 32b to the movable stages on the primary stage base 11 is reduced.

Description

technical field [0001] The present invention relates to an exposure device and an exposure method for exposing a substrate using a proximity method when manufacturing a display panel substrate such as a liquid crystal display device, and a display panel substrate using the exposure device and the exposure method. The manufacturing method particularly relates to an exposure apparatus including a plurality of moving stages, an exposure method, and a method for manufacturing a display panel substrate using the exposure apparatus and the exposure method. Background technique [0002] Thin Film Transistor (TFT) substrates, color filter (color filter) substrates, plasma display panel (plasma display panel) substrates, organic electroluminescence (Electroluminescence) , EL) display panel substrates, etc., are produced by forming a pattern on a substrate by a photolithography technique using an exposure device. The exposure device has a projection method and a proximity method. The...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20H01L21/84G02F1/1333
CPCG03F7/7035G03F7/70775G03F7/70733
Inventor 松山胜章根本亮二森顺一佐藤隆悟林知明
Owner HITACHI HIGH-TECH CORP
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