Production method and apparatus for single-slice integrated semiconductor laser array
A laser array, monolithic integration technology, applied in the field of optoelectronics, can solve problems such as the influence of lasing characteristics and the failure of lasers to work normally, and achieve the effects of reducing production costs, reducing manufacturing difficulty, and improving device performance
Patent Information
- Authority / Receiving Office
- CN · China
- Current Assignee / Owner
- Publication Date
- 2009-02-18
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Abstract
Description
Technical field
[0001] The invention belongs to the field of optoelectronic technology, is related to distributed feedback semiconductor laser arrays, and involves the design and production of complex distributed feedback semiconductor lasers. More specifically, it is a distributed feedback (DFB) semiconductor laser array prepared based on reconstruction-equivalent chirp technology. Methods and devices. Background technique
[0002] As information optoelectronics technology becomes more and more widely used in communications, detection and other fields, related industries have increasingly higher requirements for monolithic integrated devices, which is one of the commanding heights of future information technology. The use of monolithic integrated modules can provide communication core equipment with large capacity, small size, and low cost. For example, the American Infinera Company, considered the most promising emerging optical network company, has been able to provide 10...
Examples
Embodiment Construction
[0039] The structure of the distributed feedback semiconductor laser is that on the n-type substrate material, there are epitaxial n-type InP buffer layer, undoped lattice-matched InGaAsP waveguide layer, strained InGaAsP multiple quantum wells, InGaAsP grating material layer, InGaAsP waveguide layer, InP The confinement layer and the InGaAs ohmic contact layer are sequentially formed; the grating of the InGaAsP grating material layer is a sampled Bragg grating, which is the equivalent grating used for laser lasing; the surface of the equivalent grating of laser lasing is made of SiO with a thickness of 200-400nm 2 Insulation.
[0040] The sampled Bragg grating has multiple shadow gratings, and the wavelength interval between the shadow gratings is inversely proportional to the sampling period and the effective refractive index of the semiconductor laser waveguide. The following describes a 4-wavelength monolithic integrated DFB laser array with an operating wavelength in the ...