Processing device

Abstract

This invention provides a processing device for enhancing process in-plane homogeneity when processing gas flows into processing container to process the item to be processed, preventing particles from attaching on the item to be processed. In the processing container (20) having inlet / outlet (22) controlled by a switching mechanism (23) on side wall (21) thereof, a rectification structure (5) is disposed, wrapping bearing zone of bearing a stable (3) of a substrate (S), of which upper end has a transportation position higher than the substrate (S) to form a gas-hold zone for processing gas around the substrate (s) born on bearing table (3) in order to reduce flow speed of the processing gas around of the substrate (S). A tunnel element (51) is disposed on inlet / outlet (22) of the structure (5), this tunnel element (51) is used for forming transportation passage (P) of the substrate (S) between the inlet / outlet (22) and the bearing zone.

Description

technical field [0001] The present invention relates to supplying a processing gas into the processing container in a state in which, for example, an object to be processed such as an FPD (flat panel display) substrate is provided with a structure for rectification around the object to be processed, and the processing gas is used to A technique in which the above-mentioned object to be processed performs predetermined processing. Background technique [0002] In the manufacturing process of an object to be processed such as an LCD (liquid crystal display) substrate, there is a step of performing an etching process on an aluminum (Al) film formed on the object to be processed. For an example of an etching processing apparatus for performing this process, according to Figure 13 For brief description, 1 in the figure is a vacuum chamber, and in the inside of the vacuum chamber 1, a mounting table 11 for mounting an object to be processed, such as an FPD substrate S, is provide...

AI Technical Summary

Problems solved by technology

In addition, as a prior patent document related to a rectifying member, Patent Document 1 describes a structure in which a movable ring configured to be protruded by a moving mechanism is provided on a lower electrode as a rectifying member, and Patent Document 2, It is described that a side wall provided with a gas flow port is provided as a rectification member so as to surround the peripheral portion of the substrate. Patent Document 3 describes an example in which a rectification member is constituted by a plurality of side walls provided along the periphery of the substrate. However, none of the above documents describe a structure that can place a substrate on a mounting table without driving the rectifying member, and the techniques described in these documents cannot solve the above-mentioned problems.

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