Transparent conductive film production method
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- 北京东方新材科技有限公司
- Publication Date
- 2009-05-13
- Estimated Expiration
- Not applicable · inactive patent
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Abstract
Description
technical field
[0001] The invention relates to a preparation method of a transparent conductive film with low sheet resistance and high visible light transmittance. Background technique
[0002] Transparent conductive films are widely used in touch screens, liquid crystals and other fields. The requirement for the transparent conductive film is that the sheet resistance should be as low as possible, and the average transmittance in the visible light range should be as high as possible.
[0003] The substrate used for the transparent conductive film is generally glass or organic thin film, and its refractive index is between 1.5-1.6. Most of the common transparent conductive films have a high refractive index, such as ITO (In 2 o 3 : Sn) is 1.9, IZO (Zn 2 In 2 o 5 ) is 2.4. CAO with lower refractive index (CuAlO 2 ) is 1.54, but the problem of CAO is that the resistivity is too high and high-temperature annealing is required, so it is difficult to realize industriali...