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Apparatus and method for generating atmospheric-pressure plasma

A technology of plasma and generating device, which is applied in the direction of plasma, plasma welding equipment, electrical components, etc., can solve the problems of plasma P cannot be generated stably and effectively, plasma P cannot be generated stably and effectively, and the heat generation is large. , to achieve the effect of compact and cheap composition, easy assembly and simple composition

Inactive Publication Date: 2009-05-20
PANASONIC CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0014] Moreover, in the configuration where the matching circuit 46 is provided, the reactance elements such as the inductance element and the capacitor element constituting the circuit also generate heat, and this heat changes the circuit constant of the matching circuit 46, and there is a problem that the plasma P cannot be stably and efficiently generated.
[0015] Furthermore, the wiring connecting the micro-antenna 42 and the matching circuit 46 also generates a lot of heat, so the resistance of the wiring changes, causing the circuit constant of the matching circuit 46 to change, and there is a problem that the plasma P cannot be stably and efficiently generated.
Furthermore, in order to prevent the influence of heat generated on the wiring, a method of dissipating the heat generated by the wiring and a method of shortening the wiring itself have been considered, but no composition for realizing these methods has been proposed.

Method used

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  • Apparatus and method for generating atmospheric-pressure plasma
  • Apparatus and method for generating atmospheric-pressure plasma
  • Apparatus and method for generating atmospheric-pressure plasma

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Embodiment approach 1

[0060] First, refer to Figure 1 to Figure 8 Embodiment 1 of the atmospheric pressure plasma generator of the present invention will be described.

[0061] In the atmospheric pressure plasma generator 1 of the present embodiment, as figure 1 As shown, a wave-shaped antenna 3 is formed in multiple turns on a substrate 2 made of alumina, and a discharge tube 4 is arranged near the antenna 3 . In the example shown in the figure, the substrate 2 is composed of an upper substrate 2u with the antenna 3 disposed on the upper surface and a groove for forming the discharge tube 4 formed on the lower surface, and a lower substrate 2d bonded to the lower surface of the upper substrate 2u. Furthermore, the discharge tube 4 in the present invention means a constituent unit forming a cylindrical discharge space in this way, and is not necessarily limited to a tube having an inner peripheral wall and an outer peripheral wall. Furthermore, the antenna 3 is disposed close to the side 2a of ...

Embodiment approach 2

[0079] Next, Embodiment 2 of the atmospheric pressure plasma generation device of the present invention will be described with reference to FIGS. 9 to 12B. In the description of the following embodiments, the same reference numerals are assigned to the same constituent units, and descriptions are omitted, and differences are mainly described.

[0080] As shown in Figure 9~ Figure 11 As shown, the atmospheric pressure plasma generator 21 of this embodiment includes: a first substrate 22 made of alumina; 26 on the second substrate 23 in the half area of ​​one end; and the third substrate 24 arranged on the second substrate 23 . The first substrate 22 , the second substrate 23 , and the third substrate 24 are bonded together in a press-bonded state with various connectors such as screws or adhesives to form a multilayer substrate 25 . Thus, the antenna 26 is embedded in the multilayer substrate 25 in a state of being sandwiched between the first and second substrates 22 and 23...

Embodiment approach 3

[0092] Next, refer to Figure 13 , Figure 14 Embodiment 3 of the atmospheric pressure plasma generator of the present invention will be described.

[0093] In this embodiment, if Figure 13 As shown, in the area where the second substrate 23 and the third substrate 24 are not stacked on the first substrate 22 (that is, the area on the first substrate 22 where components such as three-dimensional reactance elements are arranged), specifically, in the configuration matching A fourth substrate 36 is stacked in the region of the variable capacitors 9 and 10 on the load side and the tuning side of the circuit 7 , the fixed capacitor 16 of the phase circuit 6 , and the connector 31 of the coaxial cable 29 . Such as Figure 14 As shown, the fourth substrate 26 has recesses 36a to 36b for accommodating the connector 31, the variable capacitors 9 and 10, and the fixed capacitor 16, respectively, and covers these elements in a contact state. In addition, the wiring 32 provided on t...

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Abstract

An apparatus for generating atmospheric-pressure plasma is provided with substrates (2, 22); antennas (3, 17, 26, 38) arranged on the substrates (2, 22); discharge tubes (4, 18, 28, 37) arranged in the vicinity of the antennas (3, 17, 26, 38); a high-frequency power supply (8) for supplying VHF-band high-frequency power to the antennas (3, 17, 26, 38); and a matching circuit (7) which inputs high frequency from the high-frequency power supply (8) and adjusts the reflection waves. A phase circuit (6) is connected between the matching circuit (7) and the antennas (3, 17, 26, 38). The circuit constant of the phase circuit (6) is so set as to have a position, at which the current amplitude of a standing wave is maximum, or a position, at which the voltage amplitude of the standing wave is minimum, in the vicinity of the antennas (3, 17, 26, 38).

Description

technical field [0001] The present invention relates to an atmospheric pressure plasma generating device and method for generating inductively coupled plasma under atmospheric pressure by supplying high-frequency power to an antenna disposed on a substrate and introducing gas into a discharge tube disposed near the antenna. Background technique [0002] In the past, vacuum plasma generators and atmospheric pressure plasma generators could not be used as devices mounted on automatic machines and operated due to their large size. A small-sized atmospheric pressure plasma generator (for example, refer to Patent Document 1). [0003] The atmospheric pressure plasma generating device such as Figure 20 As shown, a plasma chip 40 is used, and the plasma chip 40 includes: a substrate 41, a micro-antenna 42 in a corrugated form arranged on the substrate 41, and a discharge tube 43 arranged near the micro-antenna 42, and the discharge tube 43 is discharged from the supply unit 44. O...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H05H1/24H01L21/205H01L21/3065B23K10/00G01N37/00
Inventor 松森正史中塚茂树一木隆范
Owner PANASONIC CORP