Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Method for improving vacuum ultraviolet scaling light source stability

A vacuum ultraviolet and stability technology, used in material analysis, measuring devices, instruments, etc. by optical means, can solve the problems of deuterium lamp radiation intensity attenuation, thickness increase, etc., to improve radiation stability and high-precision radiation determination. target effect

Inactive Publication Date: 2009-05-27
CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
View PDF0 Cites 4 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

On the other hand, more or less (related to the cleanliness of the vacuum system) in the vacuum system, there will be hydrocarbons and other pollutants remaining in the vacuum chamber, which are ionized under the irradiation of vacuum ultraviolet radiation, and the ionized molecules are based on The polarity of the electric field established at the front end of the deuterium lamp window, one part is far away from the deuterium lamp window, and the other part can be attached to the window surface to form a layer of deposited film. As the irradiation time increases, the thickness of the deposited film gradually increases, resulting in deuterium lamp Gradual Decay of Radiation Intensity

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method for improving vacuum ultraviolet scaling light source stability
  • Method for improving vacuum ultraviolet scaling light source stability

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0012] The present invention is described in further detail below in conjunction with the embodiment given with accompanying drawing.

[0013] refer to figure 1 , a method for improving the stability of the vacuum ultraviolet calibration light source is to set a tubular liquid nitrogen cooling screen 3 coaxial with the outgoing light beam at the outer end of the exit window of the standard light source chamber 2 in the vacuum chamber 1 to reduce the light source exit window. The temperature of the region increases the vacuum in the region, thereby reducing the number of contaminant molecules near the exit window.

[0014] refer to figure 2 , the tubular liquid nitrogen cooling panel 3 is composed of an inner tube 3.1, an outer tube 3.2, and a spiral tube 3.3 arranged between the inner tube 3.1 and the outer tube 3.2; the inlet end 4 of the spiral tube 3.3 is connected to the liquid nitrogen storage tank 10 is communicated through the pipeline 7, and the outlet port 5 is com...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to a method for improving the stability of vacuum ultraviolet calibration light source, which is realized by arranging a tubular liquid nitrogen refrigeration screen coaxial with outgoing light beam on the external end of an outgoing window of a standard light source chamber in a vacuum chamber, thereby reducing the temperature of the outgoing window area of the light source, improving the vacuum degree of the area and reducing the quantities of contamination molecules near the outgoing window. The method of the invention effectively improves the radiation stability of the standard light source of a space ultraviolet remote sensing instrument in a vacuum ultraviolet band, thus realizing the high-precision radiation calibration of the ultraviolet spectrum remote sensing instrument.

Description

technical field [0001] The invention relates to a space ultraviolet remote sensing instrument for atmospheric environment monitoring, in particular to a method for improving the stability of a vacuum ultraviolet calibration light source of the space ultraviolet remote sensing instrument. Background technique [0002] In the field of atmospheric environment monitoring, space ultraviolet remote sensing instruments play an irreplaceable role. By detecting the solar ultraviolet spectral irradiance and atmospheric solar backscattered ultraviolet spectral irradiance, various trace gases and aerosols in the atmosphere can be calculated by inversion. To monitor the global warming effect, changes in the thickness of the ozone layer and the emission of various harmful gases, etc. [0003] Remote sensing instruments must be calibrated on the ground before launch, and the radiometric calibration accuracy will directly affect the instrument's on-orbit detection accuracy and data retrieva...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): G01S7/497G01N21/17
Inventor 王淑荣李福田林冠宇张振铎
Owner CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com