Polarized light source apparatus based on liquid crystal in photolithography lens imaging system
A technology of imaging system and light source device, which is applied in the direction of microlithography exposure equipment, photolithography exposure device, static indicator, etc., can solve the problems of complicated implementation and difficult to detect subtle changes in polarization direction, so as to facilitate switching and improve The effect of resolution
Active Publication Date: 2010-09-08
SHANGHAI HUAHONG GRACE SEMICON MFG CORP
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For example, as shown in Figure 1, it is a schematic diagram of a traditional lithography lens imaging system, including: a light source, a polarizer, a mask plane, a lens group and a silicon wafer plane, because the polarizer is in the lithography lens imaging system It is mainly used to filter out unnecessary light. Therefore, in the prior art, when a polarized light source needs to be obtained, one or more polarizers need to be inserted between the polarizer and the mask plane, but This method has the following disadvantages: it is not easy to detect subtle changes in the polarization direction, and it is more complicated to implement
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[0018] Light in nature can be arbitrarily decomposed into polarized light in two directions perpendicular to each other, and the alignment direction of liquid crystal molecules can change the polarization direction of polarized light, and is widely used in modern light sources. The refractive index of the liquid crystal will change with the alignment direction of the liquid crystal molecules, as shown in Figure 2a, when there is no electric field between the two electrodes of the liquid crystal polarization controller, that is, on the two transparent conductive films of the liquid crystal polarization controller When no voltage is applied, the alignment direction of the liquid crystal molecules is parallel to the transparent conductive film, so the direction of the polarized light transmitted through the liquid crystal polarization controller is perpendicular to the direction of the original polarized light, as shown in Figure 3a shown. Using the principle that the electric fi...
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The invention discloses a polarized light source device based on liquid crystal in a photolithographic lens imaging system. The liquid crystal is used to control the polarization direction of the polarized light in the light path of the photolithographic imaging system, thereby preventing polaroid in the prior photolithographic lens imaging system from being mechanically inserted into the light path, and consequently improving the resolution of the fine variation of the polarization direction. In addition, the polarized light source device can simply and effectively control the direction of the polarized light and facilitate the switchover between the polarized light and non-polarized light which are perpendicular to each other.
Description
technical field [0001] The invention relates to a polarized light source device in a photolithographic lens imaging system, in particular to a liquid crystal-based polarized light source device in a photolithographic lens imaging system. Background technique [0002] With the development of semiconductor technology, in order to increase the minimum resolution size of lithography, the numerical aperture (Numerical Aperture) of the lens group continues to increase. With the increase of the numerical aperture of the lens group, due to the mutual influence and interference effect between light rays at large angles, the contrast of the spatial image is greatly weakened. Therefore, with the increase of the numerical aperture, people began to use polarized light sources as exposure light sources. At the same time, the pattern on the photoresist plate is also designed in a single direction (that is, the direction of the pattern is the same as the polarization direction of the exposu...
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IPC IPC(8): G03F7/20G02F1/133
Inventor 陈福成
Owner SHANGHAI HUAHONG GRACE SEMICON MFG CORP