Semiconductor image sensing device
A technology for imaging components and semiconductors, which is applied to semiconductor devices, electrical components, and electric solid-state devices, etc., can solve the problems of complex peripheral circuit composition, reduced detection accuracy, and difficulty in reducing the size of pixels, and achieves the effect of simple circuit composition.
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Embodiment approach 1
[0046] figure 1 It is a circuit diagram illustrating a schematic configuration of key parts of the semiconductor imaging element according to Embodiment 1 of the present invention.
[0047] refer to figure 1 The pixel circuit 10 has a photodiode PD as a photosensitive detection element, a transmission gate 12 , a reset switch 14 , a voltage amplifier 16 , and a pixel selection switch 18 .
[0048] The reset switch 14 is arranged between the power supply potential node 5 to which the power supply potential VDD is supplied and the node Nf functioning as a floating diffusion, and is turned on and off in accordance with a reset control signal. The transfer gate 12 is connected between the node N1 where signal charges are stored due to the generation of photocurrent of the photodiode PD and the node Nf. The on-off of the transmission gate 12 is controlled by the transmission control signal TG.
[0049] The photodiode PD is arranged between the ground node 6 supplied with the gro...
Embodiment approach 2
[0136] Figure 12 It is a circuit diagram illustrating the configuration of a pixel circuit and an accumulated charge discharge circuit in the semiconductor imaging element according to the second embodiment.
[0137] refer to Figure 12 , In the semiconductor imaging element of Embodiment 2, an accumulated charge discharge circuit 21 is provided instead of the accumulated charge discharge circuit 20 of Embodiment 1.
[0138] The stored charge discharge circuit 21 has figure 1 In the shown stored charge discharge circuit 20 , a photodiode PD# as a “second photodetection element” is arranged between the node N2 and the ground node 6 .
[0139] Figure 13 is shown with image 3 The cross-sectional view of key parts of the stored charge discharge circuit 20 shown corresponds to the cross-sectional view of the structure of key parts of the stored charge discharge circuit 21 . from Figure 13 and image 3 As can be understood by comparison, the stored charge discharge circui...
Embodiment approach 3
[0148] Combining the pixel circuit 10 or 11 and the accumulated charge discharge circuit 20 or 21 as described above constitutes the semiconductor imaging device according to the embodiment of the present invention. Here, Embodiments 1 and 2 exemplify a circuit configuration in which the anode of the photodiode PD is fixed to the ground potential VSS, but a circuit configuration in which the polarity of each circuit is reversed and the cathode of the photodiode PD is fixed to the power supply potential VDD may also be adopted. .
[0149] Figure 14 and Figure 15 Pixel circuits 10 # and 11 # of Embodiment 3 are shown as modified examples in which the polarities of the pixel circuits 10 and 11 are respectively reversed.
[0150] In the pixel circuits 10# and 11#, the cathode of the photodiode PD is connected to the power supply potential node 5. Compared with the pixel circuits 10 and 11, the node N1 is connected to the power supply potential node 5 and the ground node 6 resp...
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