Polymer plane nano-channel production method
A production method and polymer technology, which are applied in the photoengraving process of the pattern surface, the production of microstructure devices, and the process for producing decorative surface effects, etc. Simple process, low cost, short cycle effect
Inactive Publication Date: 2012-11-21
DALIAN UNIV OF TECH
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Problems solved by technology
Laser or particle beam direct writing method requires expensive special equipment; nano hot pressing or hot pressing forming also needs special equipment, and also needs to make expensive pattern transfer template; sacrificial layer etching method requires relatively simple equipment, but often the process is complex, long production cycle
Method used
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[0016] Embodiments of the present invention will be described in detail below in conjunction with technical solutions and drawings. as attached figure 1 , 2 , 3, 4, 5 and 6, a layer of copper with a thickness of about 80nm is sputtered on the polymer substrate 1 using the JS3X-80B magnetron sputtering station produced by Beijing Chuangweina Technology Co., Ltd. Film 2; adopted from Germany The model that MicroTec Company produces is Delta 80RC's homogenizer, and the model AZ MiR701 produced by AZ Electronic Materials Co. ℃ pre-bake on a hot plate for 1 hour, and then cover the mask plate on the photoresist 3, using German The UV lithography machine of the model MA / BA6 produced by MicroTec company exposed the photoresist 3 for 30 seconds, put it into the developer solution for development, and obtained a photoresist pattern a with a width of micron order, and put it again at 55°C post-baking on a hot plate for 1 hour; using the photoresist as a mask layer, the exposed cop...
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Abstract
The invention relates to a making method of a polymer planar nano channel, which belongs to the technical field of making micro-nano flow-control chip and is used in the fields of life science, medicine, analytical chemistry, and the like. The making method comprises the following steps: firstly, making a metal masking figure with micron-sized line width on a polymer substrate on the basis of standard ultraviolet lithography and chemical wet method erosion technology; then, carrying out oxygen plasma etching on exposed polymer by means of a plasma cleaning machine and accurately controlling the etching depth of a polymer nano channel through setting etching time; and finally, removing the metal masking figure by means of chemical wet method erosion to obtain the polymer planar nano channel. The making method does not need to purchase reactive ion etching or inductive coupling plasma etching equipment with complex operation and high price in order to realize polymer etching. Moreover, the entire making process of the nano channel has simplicity, short cycle and low cost.
Description
technical field [0001] The invention belongs to the technical field of micro-nano fluidic chip manufacturing, and relates to a method for manufacturing a polymer planar nano-channel, which is applied in the fields of life science, medicine, analytical chemistry and the like. Background technique [0002] Micro-nanofluidic chip technology is one of the rapidly developing frontier fields of high-tech and interdisciplinary science and technology. It is an important technology platform for the development of life science, chemical science and information science in the future. The advantages of micro-nanofluidic chips in miniaturization, integration and portability provide a great opportunity for their applications in many fields such as biomedicine, drug synthesis and screening, environmental monitoring and protection, health and quarantine, judicial identification, and detection of biological warfare agents. a very broad prospect. Nano-channel fabrication technology is the ba...
Claims
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IPC IPC(8): G03F7/00G01N33/00B81C1/00
Inventor 刘军山乔红超刘冲徐征杜立群王立鼎
Owner DALIAN UNIV OF TECH