Ice grip/photolithographic device for cooling/heating probes by convective heat transfer with gas

Abstract

The invention relates to an ice grip / photolithographic device for cooling / heating probes by convective heat transfer with gas. The ice grip / photolithographic device comprises a cold / hot gas transmission system, an operating system and a data acquisition system; the operating system comprises a working chamber positioned on a base, wherein an observing window is arranged at the upper end of the working chamber, through holes are arranged on the left side wall and the right side wall of the observing window, and air exhaust holes are arranged on the front side wall or the rear side wall of the observing window; a two-dimensional operating platform is arranged on the base in the working chamber and makes planar two-dimensional motion, a first rotating mechanical arm and a second rotating mechanical arm are arranged at both sides of the platform, and probes are installed at the end parts of the mechanical arms; the cold / hot gas transmission system comprises a cold-source gas bottle, a heat-source gas bottle, a cold-source heat-insulation transmission line and a heat-source heat-insulation transmission line, wherein the cold-source heat-insulation transmission line and the heat-source heat-insulation transmission line which are respectively connected with the cold-source gas bottle and the heat-source gas bottle extend to the working chamber; and the data acquisition system comprises a computer, a data acquisition device connected with the computer and thermocouples, wherein the thermocouples are connected to the tip parts of the probes. The invention has the advantages of simple structure, easy realization, security, reliability, low cost, and the like.

Description

technical field [0001] The invention relates to an ice tweezers / lithography device for cooling / heating a probe by gas convection heat exchange, so as to achieve ice tweezers manipulation of micron / nanoscale objects or thermochemical micron / nano lithography processing. Background technique [0002] Recently, the international research in the field of micro / nano technology is in full swing, showing a research direction with great development prospects. Among them, the operation technology at the micro / nano scale and the processing technology at the micro / nano scale are the hotspots of researchers. [0003] With the rapid development of natural science and engineering technology towards miniaturization, the research on micro / nano manipulation technology has gradually attracted people's attention. Tools for manipulating tiny objects are generally called micro / nano tweezers, which are compared with robotic hands in the process of macro manipulation. With the help of micro / nano ...

AI Technical Summary

Problems solved by technology

However, there are certain limitations in the above two technologies, such as the heat conduction process at the micro / nano scale is greatly affected by the environment, the energy loss is relatively serious, the energy utilization rate is low, and it is easy to cause operation failure

However, it is still difficult to realize the throttling process at the micro / nano scale, and a large amount of cooling loss will cause water vapor in the environment to condense, and frost will form on the surface of the ice tweezers, making the micro-nano dimensions of the tip of the ice tweezers invalid, thus Affect the operation process

In nanolithography, resistance heating will bring the danger of high voltage, and when it is necessary to realize the array of probes, there will also be uneven heating of the probes caused by different thermal conduction rates in different directions, which will make the operation process fail.

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