Amorphous polymorph for pemetrexed disodium and preparation method thereof
A technology for pemetrexed disodium and polymorphic form, which is applied to the amorphous polymorphic form of pemetrexed disodium and its preparation field, and can solve the problems of unstable quality, large solvent residue, and difficulty in controlling crystal water. and other problems, to achieve the effect of simple drying and low production cost
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0052] Add 3.3g (7.7mmol) of pemetrexed to 50ml of methanol, heat to 40°C under nitrogen atmosphere, then dropwise add 30ml of methanol solution of sodium hydroxide (0.65g, 16.2mmol), react for 1h, and cool down to Crystallize at 5°C, filter, and dry the filter cake under reduced pressure at 50°C to obtain 3.2 g of powder, which is amorphous as detected by XRD.
Embodiment 2
[0054] Add 50g (117.0mmol) of pemetrexed to 1500ml of ethanol, under nitrogen atmosphere, heat to 30°C, then dropwise add 200ml of ethanol solution of sodium hydroxide (9.64g, 241.0mmol), react for 2h, cool to 10 °C, crystallized, filtered, and the filter cake was dried under reduced pressure at 50 °C to obtain 52.5 g of powder, which was detected as amorphous by XRD.
Embodiment 3
[0056] Add 20kg (46.8mol) of pemetrexed to 400L of methanol, under a nitrogen atmosphere, the temperature is controlled at 15°C, and then 50L of methanol solution of sodium hydroxide (3.8kg, 95.4mol) is added dropwise, and the reaction is kept at 25°C for 3h , part of the solvent was evaporated and the temperature was lowered to 5° C., crystallized, filtered, and the filter cake was dried to dryness under reduced pressure at 50° C. to obtain 21.6 kg of powder, which was detected as amorphous by XRD.
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com