Method for preparing capillary electrophoresis chip
A technology of capillary electrophoresis and chips, which is applied in the manufacture of microstructure devices, material analysis through electromagnetic means, decorative art, etc., can solve the problems of difficult to produce a wide range of sizes, and achieve easy mass production, easy manufacturing process, and transparent high light effect
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Embodiment 1
[0025] Step 1, cleaning the glass substrate, drying, sputtering Cr on the substrate as an adhesion layer, sputtering Cu on the adhesion layer as a seed layer, and laminating the adhesion layer and the seed into the first adhesion-seed layer;
[0026] Step 2, throwing the first photoresist on the first adhesion-seed layer, baking the glue, and photolithographically supporting the structural pattern of the column on the first photoresist;
[0027] The thickness of the first photoresist is 5 μm;
[0028] Step 3, electroplating the support column in the cavity of the structural pattern of the support column, the thickness of the electroplating is the same as the thickness of the first photoresist; the electroplated metal is Au;
[0029] Step 4, sputtering Cr on the first photoresist and the support column as an adhesion layer, sputtering Cu on the adhesion layer as a seed layer, and laminating the adhesion layer and the seed into a second adhesion-seed layer;
[0030] Step 5, thr...
Embodiment 2
[0037] Step 1, cleaning the glass substrate, drying, sputtering Cr on the substrate as an adhesion layer, sputtering Cu on the adhesion layer as a seed layer, and laminating the adhesion layer and the seed into the first adhesion-seed layer;
[0038] Step 2, throwing the first photoresist on the first adhesion-seed layer, baking the glue, and photolithographically supporting the structural pattern of the column on the first photoresist;
[0039] The thickness of the first photoresist is 30 μm;
[0040] Step 3, electroplating the support column in the cavity of the structural pattern of the support column, the thickness of the electroplating is the same as the thickness of the first photoresist; the electroplated metal is Au;
[0041] Step 4, sputtering Cr on the first photoresist and the support column as an adhesion layer, sputtering Cu on the adhesion layer as a seed layer, and laminating the adhesion layer and the seed into a second adhesion-seed layer;
[0042] Step 5, th...
Embodiment 3
[0049] Step 1, cleaning the glass substrate, drying, sputtering Cr on the substrate as an adhesion layer, sputtering Cu on the adhesion layer as a seed layer, and laminating the adhesion layer and the seed into the first adhesion-seed layer;
[0050] Step 2, throwing the first photoresist on the first adhesion-seed layer, baking the glue, and photolithographically supporting the structural pattern of the column on the first photoresist;
[0051] The thickness of the first photoresist is 50 μm;
[0052] Step 3, electroplating the support column in the cavity of the structural pattern of the support column, the thickness of the electroplating is the same as the thickness of the first photoresist; the electroplated metal is Au;
[0053] Step 4, sputtering Cr on the first photoresist and the support column as an adhesion layer, sputtering Cu on the adhesion layer as a seed layer, and laminating the adhesion layer and the seed into a second adhesion-seed layer;
[0054] Step 5, th...
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