Double-layer air-guide heat insulation shield of polysilicon hydriding furnace

Abstract

The invention discloses a double-layer air-guide heat insulation shield of a polysilicon hydriding furnace, which comprises an inner-layer heat insulation shield and an outer-layer heat insulation shield sleeved outside the inner-layer heat insulation shield, wherein heat insulation chassises are arranged at the bottom of the inner-layer heat insulation shield and the bottom of the outer-layer heat insulation shield, and an air-guide channel is formed between the inner-layer heat insulation shield and the outer-layer heat insulation shield; an air inlet channel is arranged at the lower part of the outer-layer heat insulation shield, and an air inlet channel is arranged at the upper part of the inner-layer heat insulation shield. In the invention, two layers of heat insulation shields are arranged, and the air-guide channel is formed between the two heat insulation shields, therefore, process tail gas can enter into a reaction region in the inner-layer heat insulation shield through the air-guide channel. The invention has the advantages: firstly, the process tail gas is poor conductor of heat and can play a better heat insulation role; secondly, the process tail gas is preheated after absorbing heat transferred from the reaction region while passing the air-guide channel, thereby improving the reaction efficiency of the process tail gas after entering into the reaction region; and thirdly, the airflow direction formed by the double-layer heat insulation shield can ensure that the device is safer and more stable.

Description

technical field [0001] The invention relates to a heat shield, in particular to a double-layer flow guide heat shield for a polycrystalline silicon hydrogenation furnace, which belongs to the technical field of solar photovoltaic energy. Background technique [0002] With the rapid development of the international electronic information industry and photovoltaic industry, the polysilicon product market has been in the ascendant. Along with the production of polysilicon, the treatment of silicon tetrachloride in the process tail gas has become increasingly prominent. If it is not handled properly, it will cause serious environmental pollution problems. Moreover, with the intensification of market competition, the industry is also eager to increase production and reduce emissions, and recycle silicon tetrachloride. [0003] As a process tail gas treatment device, the polysilicon hydrogenation furnace has very harsh process conditions. Silicon tetrachloride needs to be reacte...

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Problems solved by technology

Due to the very high speed of the airflow, the exhaust gas has a great upward thrust on the heat shield, which can easily cause the heat shield to be unstable and cause safety problems

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