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Vapor deposition material and optical thin film obtained from the same

A technology for evaporation materials and optical thin films, which is applied in vacuum evaporation coating, metal material coating process, sputtering coating, etc. Public knowledge and other issues

Active Publication Date: 2011-06-08
FUJI TITANIUM IND
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

In addition, even if such countermeasures are taken, the distribution of heat applied to the molten pool tends to fluctuate, and as a result, it is difficult to control the evaporation rate.
As mentioned above, there is no known multi-system vapor deposition material that can easily form a desired high refractive index film without taking special measures for electron beam operation.

Method used

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  • Vapor deposition material and optical thin film obtained from the same
  • Vapor deposition material and optical thin film obtained from the same
  • Vapor deposition material and optical thin film obtained from the same

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0051] Mix the powders of niobium (V) oxide and lanthanum (III) oxide at a weight ratio of 32.9:67.1 (the molar ratio of niobium and lanthanum is 37.5:62.5), and granulate the powder mixture into granules of 1 to 3 mm in size. Fired at 1300° C. for 4 hours to obtain a granular vapor deposition material. The material is based on figure 1 The X-ray diffraction pattern shown was identified as La 3 NbO 7 and LaNbO 4 .

[0052] In a commercially available vacuum vapor deposition device, a copper-made Haslina (crucible) filled with the vapor deposition material was installed, and the device was exhausted to 1.0×10 -3 After Pa, the vapor deposition material is melted by electron beam heating to form a molten pool. Next, take the overall pressure to 1.0 x 10 -2Oxygen is introduced in the form of Pa, and only the center of the molten pool is irradiated with electron beams again to generate material vapor. On the substrate pre-set in the device and heated to 300°C, the film is for...

Embodiment 2

[0060] Mix the powders of niobium (V), lanthanum (III) oxide and metallic niobium at a weight ratio of 45.5:46.5:8.0 (the molar ratio of niobium to lanthanum is 60.0:40.0), and form the powder mixture into a sheet of 1 to 3 mm In the form of a tablet, the evaporation material in the form of a tablet is obtained by firing in a vacuum at 1600°C for 4 hours. The material was identified as LaNbO based on the X-ray diffraction pattern 4 and NbO.

[0061] For each film formed by the same method as in Example 1 using this vapor deposition material, the refractive index at a wavelength of 450 nm, the shortest transmission wavelength, and the molar ratio of niobium and lanthanum were determined. The results are shown in Tables 1 and 2. The refractive index and molar ratio are the same regardless of the number of films formed, and the shortest transmission wavelength is 305 nm.

Embodiment 3

[0063] Mix the powders of niobium (V) oxide and lanthanum (III) oxide at a weight ratio of 80.3:19.7 (the molar ratio of niobium to lanthanum is 83.3:16.7), and form the powder mixture into a tablet shape of 1-3mm, and pass through Baking was performed at 1200° C. for 4 hours in the air to obtain a tablet-shaped vapor deposition material. The material was identified as LaNb based on the X-ray diffraction pattern 5 o 14 .

[0064] For each film formed by the same method as in Example 1 using this vapor deposition material, the refractive index at a wavelength of 450 nm, the shortest transmission wavelength, and the molar ratio of niobium and lanthanum were determined. The results are shown in Tables 1 and 2. The refractive index and molar ratio are the same regardless of the number of films formed, and the shortest transmission wavelength is 330 nm.

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Abstract

The invention relates to a vapor deposition material composed of a two-component oxide of niobium and lanthanum, or a vapor deposition material composed of the two-component oxide and niobium metal and / or lanthanum metal. This vapor deposition material is characterized in that the molar ratio between niobium and lanthanum is from 25:75 to 90:10.

Description

technical field [0001] The present invention relates to an evaporation material for forming an optical thin film on a base material and an optical thin film formed using the material, and particularly relates to an evaporation material for forming an optical thin film which transmits visible light and near-ultraviolet regions and has a high refractive index And the optical film formed by using the material. Background technique [0002] In this specification, an optical thin film refers to a thin film formed by applying the interference phenomenon of light that occurs on a film having a thickness corresponding to the wavelength of light to impart functions such as anti-reflection or increased reflection. [0003] Such an optical thin film is formed by disposing a single-layer film or a laminated film of about two to one hundred layers on a base material based on a previously designed film structure in order to express desired optical performance. Thereby, optical properties...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/24G02B1/11C23C14/08
CPCC23C14/0688C23C14/083C23C14/08C23C14/22C23C14/221C23C14/24G02B1/11
Inventor 高桥修平小坂金雄冈田均
Owner FUJI TITANIUM IND
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