Dislocation corrosion detecting method of single germanium wafer

A germanium single wafer, corrosion detection technology, applied in the field of germanium single wafer dislocation corrosion detection

Inactive Publication Date: 2010-02-24
CHINA ELECTRONICS TECH GRP NO 46 RES INST
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  • Abstract
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Problems solved by technology

[0004] The invention provides a method for detecting dislocation corrosion of a germanium single wafer, which is used to solve the problems existing in the prior art that the single crystal crystal orientation needs to be cut into a wafer within 6° of the crystal orientation for detection, and the detection can only be performed on a single crystal wafer. Dislocation detection can only be done by cutting in a special way during crystal inspection

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  • Dislocation corrosion detecting method of single germanium wafer
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Embodiment Construction

[0028] The specific implementation manners of the present invention will be further described below in conjunction with the drawings and examples. The following examples are used to illustrate the present invention, but are not intended to limit the scope of the present invention.

[0029] combine figure 1 , figure 2 , the following are the specific implementation steps of the germanium single wafer dislocation corrosion detection method deviated from the crystal orientation 9° of the present embodiment:

[0030] The first step is to place a polished germanium single crystal wafer with a thickness of not less than 150 μm in an acid and alkali resistant container.

[0031] In the second step, hydrofluoric acid (HF) and nitric acid (HNO 3 ) according to the volume ratio of 1:3 to 4 (ratio of 1:3 to 1:4) to prepare chemical polishing liquid, the concentration of hydrofluoric acid used is 40%, and the concentration of nitric acid is 65% to 68%. The process is as follows:

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Abstract

The invention discloses a dislocation corrosion detecting method of a single germanium wafer, comprising the following steps: putting a polished single germanium wafer into dislocation corrosion solution formed by mixing the water solution of hydrofluoric acid, nitric acid and copper nitrate to corrode, and detecting the dislocation density after the corrosion. In the invention, dislocation diction is carried out on the single germanium wafer, and can be used for directly detecting a cutting wafer, a grinding wafer and a polishing wafer of the single wafer cutting the wafers into wafers with dislocation <100> wafer direction of 6 degrees in a wafer direction, thereby reducing the lose of the single wafer and shortening working procedures. By adopting the method for the dislocation detection of the single germanium wafer, a product of the single germanium wafer in any working procedure can be detected by the dislocation, thereby the method avoids the condition that dislocation detectioncan be carried out only by cutting the single germanium wafer in a special mode in single wafer detection, ensures that the dislocation detection of the single germanium wafer can be carried out at any moment and is beneficial to executing quality control.

Description

technical field [0001] The invention relates to the technical field of defect corrosion detection, in particular to a germanium single wafer dislocation corrosion detection method. Background technique [0002] Germanium solar cells are widely used in aerospace fields such as artificial satellites, spacecraft, and space stations. Compared with traditional silicon solar cells, single-junction and multi-junction compound solar cells made of epitaxial GaAs / InGaP on germanium single crystal substrates have High conversion efficiency, high temperature resistance, radiation resistance, strong reliability and other advantages, so it has been more and more widely used. [0003] Germanium single wafer is the substrate material of solar cells, and the defects of the substrate material directly affect the quality of the epitaxial layer on its surface. From the perspective of reliability requirements, it is hoped that the substrate material is a perfect single wafer without any defects....

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01N1/32
Inventor 佟丽英赵权史继祥王聪李亚光
Owner CHINA ELECTRONICS TECH GRP NO 46 RES INST
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