Alumina carrier and preparation method thereof
A technology of alumina carrier and alumina, which is applied in the direction of catalyst carrier, chemical instrument and method, chemical/physical process, etc., can solve the problem of not being able to provide pore distribution, etc.
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example 1
[0038] The slurry of hydrated alumina is obtained by the neutralization reaction of sodium metaaluminate and carbon dioxide gas.
[0039] The prepared high-concentration NaAlO containing 210g / L alumina and a caustic coefficient of 1.62 2 solution with deionized water to prepare Al 2 o 3 Transfer 5L of the solution with a concentration of 40±2g / L to a gelling reactor with a total volume of 8L. The reactor has an aspect ratio of 8 and a CO 2 gas distributor. Control the temperature of the solution at 25±5°C, and feed CO with a concentration of 90V% from the bottom of the reactor 2 gas for gelation reaction, the gelation temperature is controlled at 20-40°C, and the CO 2 The gas flow rate is 15±2L / min, and the pH value at the end of the reaction reaches 8.0-8.5 within 4-6 minutes. When the pH value of the process drops to the required range, stop the aeration and end the gelation reaction. The resulting slurry was filtered with a vacuum filter, and after the filtration was ...
example 2
[0041] The amorphous hydrated aluminum oxide used is the same as in Example 1, and the preparation method of the carrier is also the same as in Example 1, but the amount of glucose and acid added during extruding are different from Example 1, and the specific formula is shown in Table 1. Put the obtained wet carrier strip into an oven at 120°C to dry for more than 4 hours, then put it into a muffle furnace and bake it at 600°C for 4 hours, and the obtained sample is subjected to N 2 Adsorption analysis specific surface area, pore volume and pore size distribution are shown in Table 2.
example 3
[0043] The amorphous hydrated alumina used is the same as in Example 1, and the carrier preparation method is also the same as in Example 1, but the amount of acid and glucose added during extruding are different from Example 1. The specific formula is shown in Table 1. Put the obtained wet carrier strip into an oven at 120°C to dry for more than 4 hours, then put it into a muffle furnace and bake it at 600°C for 4 hours, and the obtained sample is subjected to N 2 Adsorption analysis specific surface area, pore volume and pore size distribution are shown in Table 2.
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