Six-freedom-degree precision positioning table for nano-imprint lithography system

Abstract

The invention discloses a six-freedom-degree precision positioning table for a nano-imprint lithography system, wherein a spatial flexibility mechanism comprises a pre-tightening mechanism, three first displacement sensor and three first piezoelectric ceramic drivers, the pre-tightening mechanism comprises an elastic pre-tightening ring connected with a rigid ring, a base, a vertical column, three bottom elastic hinges and a first displacement sensor, the piezoelectric ceramic drivers are pushed on the elastic hinges; a plane flexibility mechanism comprises a rigid ring, a rigid supporting table, three flexible branched chains and three second piezoelectric ceramic drivers, each flexible branched chain comprises three top part elastic gemels, three second elastic gemels are connected by a driving connecting rod and a middle connecting rod, two second elastic gemels are respectively connected with the rigid ring and the rigid supporting table, the second piezoelectric ceramic drivers are pushed against on the driving connecting rod, three pairs of the supports are arranged, and each pair of the supports are connected with a second displacement sensor, and the rigid supporting table is connected with a movable platform; the working table has high resolution ratio and rapid dynamic response speed.

Description

technical field [0001] The invention belongs to a micro-operating system, in particular to a six-degree-of-freedom precision positioning workbench applicable to an imprint photolithography system. Background technique [0002] Nano-devices include nano-electronic devices and nano-optoelectronic devices, which can be widely used in electronics, optics, micro-mechanical devices, new computers, etc. It is the most dynamic research field in the field of new materials and new devices. , intelligence, high integration and other mainstream development directions. Due to the potential huge market and national defense value of nano-devices, the methods, approaches and processes of its design and manufacture have become the research and investment hotspots of many scientists, governments and large enterprises. At present, the design and manufacture of nano-devices is in a period of rapid development, and there are various methods, and patterning technology is one of them. [0003] N...

AI Technical Summary

Problems solved by technology

Among these existing technologies, although the self-adaptive adjustment precision positioning system is simple in structure, compact in structure and low in cost, its positioning accuracy, especially the adjustment accuracy of parallelism is low, which limits the improvement of processing accuracy and quality

Although the parallelism between the imprint template and the substrate can be improved to a certain extent through active leveling and manual adjustment mechanisms, it cannot compensate for the parallelism error between the template and the substrate due to uneven imprint force during the imprinting process

The airbag cylinder type imprinting system overcomes the disadvantages that the silicone is easily stretched and deformed during the imprinting process, the imprinting force is unevenly distributed, and the template is easy to break. However, the design and use of the vacuum chamber is expensive and the imprinting time is too long.

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