Control method of plasma by magnetic field in an exhaust gas treating apparatus and an exhaust gas treating apparatus using the same
An exhaust gas treatment device and plasma technology, applied in plasma, gas treatment, separation methods, etc., can solve problems such as damage to reaction tubes, increased consumption, and problems with device durability, and achieve the generation of magnetic fields, The effect of improving processing efficiency and preventing scattering
An exhaust gas treatment device and plasma technology, applied in plasma, gas treatment, separation methods, etc., can solve problems such as damage to reaction tubes, increased consumption, and problems with device durability, and achieve the generation of magnetic fields, The effect of improving processing efficiency and preventing scattering
CN101856581AActive Publication Date: 2010-10-13CLEAN TECH CO LTD
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[0065] Such as figure 1 As shown, a coil 71 is arranged as a magnetic field generating unit 7 on the outer peripheral portion of the reaction tube 1 and the water-cooled jacket 11 constituting the plasma discharge part for introducing the exhaust gas G, and a current (DC current), so that a magnetic field (a magnetic field in which the lines of force flow from the upper electrode 2 toward the lower electrode 3) is generated, and CF is decomposed as exhaust gas G 4 .
[0066] Table 1 shows the results.
[0067] Table 1
[0068] Current value (A)
[0069] As shown in Table 1, it was confirmed that the larger the current value flowing through the coil 71, the CF 4 The higher the decomposition rate is.
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To present a control method of plasma by magnetic field in an exhaust gas treating apparatus and an exhaust gas treating apparatus using the same, in a simple method and structure, without extremely increasing the consumption of energy, or without lowering the absolute amount of treatment. [Solving Means] In an exhaust gas treating apparatus for decomposing and treating an exhaust gas introduced into a reaction tube 1 by the plasma generated in the reaction tube 1, by generating a magnetic field in the reaction tube 1, the state of the plasma generated in the reaction tube 1 is controlled.
Description
technical field [0001] The present invention relates to a method for controlling plasma using a magnetic field in an exhaust gas treatment device and an exhaust gas treatment device using the same, in particular to controlling the state of the plasma by generating a magnetic field so that the exhaust gas performed by the plasma can be improved. A method of controlling plasma using a magnetic field in an exhaust treatment device with high treatment efficiency and an exhaust treatment device using the same. Background technique [0002] Conventionally, an exhaust gas treatment device using plasma has been proposed and put into practical use in the process of treating exhaust gas generated in the manufacture of semiconductors, etc. (for example, refer to Patent Document 1). [0003] In this exhaust gas treatment device, as a method of improving the decomposition efficiency of the treated exhaust gas, there are the following methods, etc.: (1) a method of increasing the plasma l...
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Patent Timeline
13 Oct 2010
Publication
CN101856581A
- IPC
- B01D53/32; B01D53/68; B01D53/70
- CPC
- B01D2257/2066; B01D53/32; B01D2258/0216; B01D2259/818; B01D2257/204; H05H1/24; H05H1/50; H05H2245/17
- Inventors
- 淡路敏夫; 中山贵志