Method for vacuumizing cavity
A vacuum pumping and cavity technology, which is applied in the field of heating the getter material to generate steam to adsorb gas molecules, which can solve the problems of insignificant effect and increased cost, and achieve the effects of saving time, increasing production capacity, and reducing the time for vacuuming
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[0037] The foregoing and other technical contents, features and effects of the present invention will be clearly presented in the following detailed description of preferred embodiments with reference to the accompanying drawings.
[0038] The invention provides a method for evacuating a cavity for film deposition in a semiconductor manufacturing process, which can save the time for evacuating the cavity. figure 1 Shown is the application of an embodiment of the present invention. Firstly, a thin film deposition chamber 10 for semiconductor manufacturing is provided. There is a carrying platform 100 in the chamber 10, which is used to carry several crucibles (crucible) 101-103, wherein a crucible ( Crucible) 102 places a getter material 1020, and this getter material is a titanium block in the embodiment of the present invention, and the getter material 1020 is heated by a heater 104 to generate steam during the pumping process to capture the residual gas in the cavity Molecul...
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