Eureka AIR delivers breakthrough ideas for toughest innovation challenges, trusted by R&D personnel around the world.

Process for synthesizing low-chlorine polyphenylene sulfide resin

A technology of polyphenylene sulfide resin and synthesis process, which is applied in the field of polymer material resin synthesis to achieve the effects of shortening the synthesis time, increasing the reaction speed, and improving production efficiency

Active Publication Date: 2011-01-05
四川得阳特种新材料有限公司
View PDF5 Cites 21 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] As far as the existing polyphenylene sulfide synthesis technology is concerned, the synthesis of polyphenylene sulfide resin generally uses sodium sulfide and p-dichlorobenzene (P-DCB) as raw materials, although the American Phillips company and Japanese polyphenylene sulfide resin The polyphenylene sulfide resin produced by the production company has basically not changed much in raw materials, so that the polyphenylene sulfide resin can achieve the purpose of low chlorine by adding auxiliary materials, but it has not been mixed with other Na 2 SO 4 and hydrogen sulfide specific process introduction

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Process for synthesizing low-chlorine polyphenylene sulfide resin
  • Process for synthesizing low-chlorine polyphenylene sulfide resin

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0024] In a 1L dehydration kettle, add sodium sulfide (Na 2 S.5H 2 O) 2.0mol, at 99.99% CO 2 Under the protection of gas, the temperature is heated to 120°C, and the input insulation temperature is 120°C. Three layers of 18cm / layer 5 angstrom molecular sieve water absorption columns are installed. After the molecular sieve absorbs water, the molar ratio of sodium sulfide and water in the sodium sulfide solution becomes 1:1.2, then use 4.5mol / molNa 2 The NMP solvent of S is added from the top of the water absorption column of the molecular sieve, directly flows into the 2L high-pressure reactor, and then the molar mass of NaOH is added to the reactor with a molar mass of 0.1mol / molNa 2 S, after raising the temperature to 130°C, add 2mol of p-dichlorobenzene. Then replace the air in the reactor with carbon dioxide gas 3-5 times, then seal the reactor, the temperature rises to 238°C, and keeps at this temperature for 2h, and when the temperature drops to 130°C, add 0.1mol / molN...

Embodiment 2

[0026] In a 1L dehydration kettle, add sodium sulfide (Na 2 S.5H 2 O) 2.0mol, at 99.99% CO 2 Under the protection of gas, the temperature is heated to 125°C, and the input holding temperature is 125°C. Three layers of 18cm / layer 5 angstrom molecular sieve water absorption columns are installed. After the molecular sieve absorbs water, the molar ratio of sodium sulfide and water in the sodium sulfide solution becomes 1:1.3, then use 4.5mol / molNa 2The NMP solvent of S is added from the top of the water absorption column of the molecular sieve, directly flows into the 2L high-pressure reactor, and then the molar mass of NaOH is added to the reactor with a molar mass of 0.2mol / molNa 2 S, after raising the temperature to 135°C, add 2mol of p-dichlorobenzene. Then replace the air in the reactor with carbon dioxide gas 3-5 times, then seal the reactor, the temperature rises to 240°C, and keeps at this temperature for 2.5h, and when the temperature drops to 135°C, add 0.04mol / molNa...

Embodiment 3

[0028] In a 1L dehydration kettle, add sodium sulfide (Na 2 S.5H 2 O) 2.0mol, at 99.99% CO 2 Under the protection of gas, the temperature is heated to 130°C, and the input holding temperature is 130°C. Three layers of 18cm / layer 5 angstrom molecular sieve water absorption columns are installed. After the molecular sieve absorbs water, the molar ratio of sodium sulfide and water in the sodium sulfide solution becomes 1:1.5, then use 4.5mol / molNa 2 The NMP solvent of S is added from the top of the water absorption column of the molecular sieve, directly flows into the 2L high-pressure reactor, and then the molar mass of NaOH is 0.3mol / molNa 2 S, after raising the temperature to 140°C, add 2mol of p-dichlorobenzene. Replace the air in the reactor with carbon dioxide gas 3-5 times, and then seal the reactor, the temperature rises to 242°C, and keeps at this temperature for 3 hours, and when the temperature drops to 140°C, add 0.05mol / molNa 2 Industrial Grade Na of S 2 SO 4 ,...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
melting pointaaaaaaaaaa
Ash contentaaaaaaaaaa
molecular weight distributionaaaaaaaaaa
Login to View More

Abstract

The invention discloses a process for synthesizing low-chlorine polyphenylene sulfide resin. Sodium sulfide and paradichlorobenzene are used as raw materials, N-methyl-2-pyrrolidone is used as a solvent, and the molar ratio of the sodium sulfide to the paradichlorobenzene is 1:1. The synthesis process mainly comprises the following steps of: in a sodium sulfide dehydration treatment phase, carrying out sodium sulfide solution insulating and water sucking treatment by adopting three layers of 18cm water sucking column containing a 5 angstrom molecular sieve in each layer to form a sodium sulfide solution with the water content of 1.2-1.5mol / molNa2S and adding NaOH with the molar mass of 0.1-0.3mol / molNa2S; and in the polycondensation phase, adding Na2SO4 of 0.1-0.05mol / molNa2S and H2S gas of 0.01mol / molNa2S. The invention has lower halogen total content and polydispersion coefficient in the obtained product, narrow molecular weight distribution, high oxygen index and excellent electrical insulating property and can be used as a packaging material of an electronic device.

Description

technical field [0001] The invention belongs to the synthesis of polymer material resin, especially the field of polyphenylene sulfide resin production. Background technique [0002] High-performance polyphenylene sulfide has excellent chemical resistance and thermal stability at high temperatures, and has flame retardancy, insulation, radiation resistance and good mechanical properties. In order to explore the synthesis method of this material, researchers from all over the world have been working hard to find it. [0003] In U.S. Patent No: 4761468, it is described to use chemical substances such as mercapto and mercapto metal salts to treat the polyphenylene sulfide resin after the polyphenylene sulfide resin is synthesized, thereby reducing the content of chlorine in the polyphenylene sulfide resin. Later, polyphenylene sulfide resin is applied to the field of electronic components through modification, and its main purpose is to improve the insulation performance of po...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C08G75/02C08G75/0213C08G75/0254
Inventor 苟梁武胥德强刘彬包兴泽李贤虎杨华龚海明刘文良徐伟蒋每雄
Owner 四川得阳特种新材料有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com