Device for recycling silicon wafer cleaning wastewater

Abstract

The invention relates to a device for recycling silicon wafer cleaning wastewater. The device comprises a recycled water reservoir, a booster water pump, a pressure water tank and a degumming machine water storage tank which are communicated with one another, wherein a first liquid level sensor is arranged in the recycled water reservoir; the pressure water tank is provided with a pressure sensor; the first liquid level sensor and the pressure sensor are electrically connected with an electric controller of the booster water pump; a second liquid level sensor is arranged in the degumming machine water storage tank; and the second liquid level sensor is electrically connected with a first electromagnetic valve and a second electromagnetic valve. The invention can make full use of the wastewater discharged by a cleaner for the degumming machine, thereby improving the recovery rate of the wastewater, effectively saving the production water and reducing wastewater discharge; moreover, the invention also can omit a wastewater recycling device carried by the cleaner and the degumming machine and save production cost as well as equipment cost.

Description

technical field [0001] The invention relates to a silicon chip cleaning machine in the photovoltaic industry, in particular to a silicon chip cleaning wastewater recycling device. Background technique [0002] In the production of silicon wafers in solar energy production enterprises, the cut silicon wafers have to undergo multi-stage cleaning to remove the mortar, oil, dust and other attachments attached to the surface of the silicon wafers, so as to meet the processing requirements of the subsequent process. The silicon wafer cleaning machine currently used is a multi-stage tank cleaning machine, generally composed of nine cleaning tanks, using a stepped tank design, and using the wastewater discharged from the five tanks in the back to replenish water in the front one to four tanks , Realized the partial reuse of discharged wastewater, but the wastewater reuse rate was less than 10%, and increased the manufacturing cost of each washing machine. Contents of the invention...

AI Technical Summary

Problems solved by technology

The silicon wafer cleaning machine currently used is a multi-stage tank cleaning machine, generally composed of nine cleaning tanks, using a stepped tank design, and using the wastewater discharged from the five tanks in the back for replenishing water in the first to four tanks , to achieve partial reuse of discharged wastewater, but the wastewater reuse rate is less than 10%, and increases the manufacturing cost of each washing machine

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