Panel quality virtual measurement method and system for TFT-LCD etching process

A panel and process technology, applied in the field of virtual measurement of panel quality, can solve the problems of not being able to understand the impact of panel quality and finding the key factors of variation, and achieve the effect of reducing complexity and frequency

Inactive Publication Date: 2011-02-16
JIANGSU UNIV
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Problems solved by technology

[0006] The purpose of the present invention is to provide a virtual measurement method and system for predicting the panel quality of TFT-LCD manufacturing process, to solve the problem that the existing virtual measurement method compresses data to replace the original variables, so that field engineers cannot understand each T...

Method used

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  • Panel quality virtual measurement method and system for TFT-LCD etching process
  • Panel quality virtual measurement method and system for TFT-LCD etching process
  • Panel quality virtual measurement method and system for TFT-LCD etching process

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Embodiment

[0055] refer to image 3, when the system of the present invention is implemented, it consists of etching tank 320, acid solution 310, nozzle device 380, liquid supply device 350, delivery pump 360, storage tank 370, and delivery device 340, etc. The panel 330 is placed on the conveying device 340, and the acid liquid of 39°C to 44°C is sprinkled on the panel 330 from the nozzle of the spray head device 380, and the panel 330 is swung left and right by the conveying device 340, so that it fully reacts with the acid liquid 310, and then Atoms on the surface of the film are removed for etching purposes. It can be seen from the figure that the etching effect is directly related to the etching time, the spraying pressure of the flushing, the temperature of the acid solution and the consumption process of the acid solution. Among them, the etching time, reaction temperature, spraying pressure, etc. can be obtained directly by means of relevant instruments, but the consumption of a...

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Abstract

The invention discloses a panel quality virtual measurement method and a panel quality virtual measurement system for a thin film transistor-liquid crystal display (TFT-LCD) etching process. The method comprises the following steps that: an advanced process control unit acquires the process parameter data value of at least one process machine; a measurement machine acquires panel quality measurement values; a panel quality data processing unit subtracts the average value of the panel quality measurement values from a sampled panel quality measurement value and then divides the difference by standard deviation of the panel quality measurement value; a key parameter selection unit selects a key process parameter data value; a linear model pre-estimation unit establishes an initial pre-estimation model by a linear least square algorithm; a multi-product benefit processing unit generates an initial multi-product pre-estimation model; and a distracter coefficient processing unit acquires an estimation value and processes the estimation value by a time sequence recursive algorithm to generate a distracter coefficient and then establish a virtual measurement model unit. Through the method and the system, the quality of various panels with the same process formula and different specifications can be forecast, the frequency of sampling measurement is reduced and the complexity of the pre-estimation model is reduced.

Description

technical field [0001] The present invention relates to a panel quality virtual measurement method and system for predicting thin film transistor liquid crystal display (TFT-LCD) manufacturing process, especially a panel quality virtual measurement method and system applied to TFT-LCD etching process . Background technique [0002] At present, in the front-end process of TFT-LCD, the etching process is to partially cover the film to be retained with photoresist, and after exposure and development, remove it by physical or chemical means to form the required picture of. The etching process can be divided into two types according to the etching precision, etching method and purpose: wet etching method and dry etching method. Among them, the dry etching method includes the plasma etching method and the reactive ion etching method; while the wet etching method uses various chemical solutions to chemically react with the exposed film to achieve the purpose of etching. The qual...

Claims

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Application Information

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IPC IPC(8): G05B13/04H01L21/66
Inventor 陈山潘天红盛碧琦
Owner JIANGSU UNIV
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