Panel quality virtual measurement method and system for TFT-LCD etching process

Abstract

The invention discloses a panel quality virtual measurement method and a panel quality virtual measurement system for a thin film transistor-liquid crystal display (TFT-LCD) etching process. The method comprises the following steps that: an advanced process control unit acquires the process parameter data value of at least one process machine; a measurement machine acquires panel quality measurement values; a panel quality data processing unit subtracts the average value of the panel quality measurement values from a sampled panel quality measurement value and then divides the difference by standard deviation of the panel quality measurement value; a key parameter selection unit selects a key process parameter data value; a linear model pre-estimation unit establishes an initial pre-estimation model by a linear least square algorithm; a multi-product benefit processing unit generates an initial multi-product pre-estimation model; and a distracter coefficient processing unit acquires an estimation value and processes the estimation value by a time sequence recursive algorithm to generate a distracter coefficient and then establish a virtual measurement model unit. Through the method and the system, the quality of various panels with the same process formula and different specifications can be forecast, the frequency of sampling measurement is reduced and the complexity of the pre-estimation model is reduced.

Description

technical field

[0001] The present invention relates to a panel quality virtual measurement method and system for predicting thin film transistor liquid crystal display (TFT-LCD) manufacturing process, especially a panel quality virtual measurement method and system applied to TFT-LCD etching process . Background technique

[0002] At present, in the front-end process of TFT-LCD, the etching process is to partially cover the film to be retained with photoresist, and after exposure and development, remove it by physical or chemical means to form the required picture of. The etching process can be divided into two types according to the etching precision, etching method and purpose: wet etching method and dry etching method. Among them, the dry etching method includes the plasma etching method and the reactive ion etching method; while the wet etching method uses various chemical solutions to chemically react with the exposed film to achieve the purpose of etching. The qual...

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