Substrate-glaring SiC substrate vertical structure light-emitting tube and preparation method thereof

A technology of vertical structure and light-emitting tubes, applied in the direction of electrical components, circuits, semiconductor devices, etc., can solve the problems of high refractive index and low light output rate, improve output power and brightness, overcome high refractive index, and avoid expensive prices Effect

Active Publication Date: 2011-05-18
HUAIAN AUCKSUN OPTOELECTRONICS TECHNOLOGY CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, due to the large refractive index of the SiC material, most of the light emitted by the active region is absorbed by the substrate, so the light extraction rate is low.

Method used

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  • Substrate-glaring SiC substrate vertical structure light-emitting tube and preparation method thereof
  • Substrate-glaring SiC substrate vertical structure light-emitting tube and preparation method thereof
  • Substrate-glaring SiC substrate vertical structure light-emitting tube and preparation method thereof

Examples

Experimental program
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Effect test

Embodiment 1

[0032] A new type of substrate light-emitting SiC substrate vertical structure light-emitting tube. The structure of this new type of substrate light-emitting SiC substrate vertical structure light-emitting tube is shown in the appendix figure 2 , sequentially by the substrate 1, the n-type GaN buffer layer epitaxially grown on the substrate 1 and the lower confinement layer 2, the GaN material system multi-quantum well light-emitting layer 3 prepared on the lower confinement layer 2, and the p-type GaN prepared on the light-emitting layer 3 GaN upper confinement layer 4, p-type In prepared on the upper confinement layer 4 x Ga 1-x N cover layer 5, the upper electrode 6 prepared on the cover layer 5, and the lower electrode 7 prepared below the substrate 1 are composed, and it is characterized in that: the upper electrode 6 is prepared to have the function of a reflector concurrently, and at the same time, in order to compensate for the reflection of light on the metal refle...

Embodiment 2

[0035] Transparent dielectric thin film substrate emits light and SiC substrate vertical structure light emitting tube. The structure of this kind of transparent medium film type substrate emits light SiC substrate vertical structure light-emitting tube, see the appendix image 3 , which is characterized in that: the upper electrode 6 is prepared to function as a mirror, and a layer of p-type In is grown between the cap layer 5 and the upper electrode 6 y Ga 1-y The N-phase matching layer 8 and the upper electrode 6 are all covered on the phase matching layer 8 and the cover layer 5. The substrate 1 is an n-type SiC single crystal substrate. A layer of ZnO thin film 9 is prepared under the substrate 1. In order to slow down the ZnO material Refractive index still greatly influences the light output rate, and then prepares a layer of transparent dielectric film 10 with a refractive index between the ZnO material refractive index and the air refractive index under the ZnO film ...

Embodiment 3

[0038] ZnO nanowire substrate emits light and SiC substrate vertical structure light-emitting tube. This kind of ZnO nanowire substrate emits light and SiC substrate vertical structure light-emitting tube structure is shown in the appendix Figure 4 , which is characterized in that: the upper electrode 6 is prepared to function as a mirror, and a layer of p-type In is grown between the cap layer 5 and the upper electrode 6 y Ga 1-y The N-phase matching layer 8 and the upper electrode 6 are all covered on the phase matching layer 8 and the cover layer 5. The substrate 1 is an n-type SiC single crystal substrate. A layer of ZnO thin film 9 is prepared under the substrate 1. In order to slow down the ZnO material If the refractive index is still high, the light is reflected back to the light-emitting area, which affects the light extraction rate. A layer of ZnO nanowires 11 is prepared under the ZnO film 9, and the electrode 7 is prepared under the substrate 1 only covering 5% t...

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Abstract

The invention belongs to the technical field of semiconductor devices and preparation thereof, and relates to several GaN-based light-emitting tubes and preparation methods thereof. A device is composed of a substrate, an n type GaN buffer layer and a lower limit layer 2 epitaxially grown on the substrate, a GaN material multiple quantum well light-emitting layer 3, a p type GaN upper limit layer 4, a p type InxGa1-xN cover layer 5, an upper electrode 6 and a lower electrode 7. The light-emitting tube and the preparation method of the invention are characterized in that the upper electrode 6 is prepared to have a reflector function, a p type InyGa1-yN phase matching layer 8 is grown between the cover layer 5 and the upper electrode 6, the substrate 1 is an n type Sic single crystal substrate, a ZnO thin film layer 9 is prepared under the substrate 1 or a ZnO nanowire layer 11 is also prepared under the substrate 1, and the electrode 7 is prepared under the substrate 1 by only covering 5%-20% area. The invention provides a novel large-power SiC substrate vertical structure light-emitting tube and a preparation method thereof based on advantages that a SiC substrate crystal lattice and a GaN are well matched, electric conduction performance and heat conduction performance are both higher, and price is moderate.

Description

technical field [0001] The invention belongs to the technical field of semiconductor light-emitting devices and their preparation, in particular to a GaN-based light-emitting tube and a manufacturing method thereof. Background technique [0002] With the breakthrough of the third-generation semiconductor material gallium nitride and the advent of blue, green, and white light-emitting diodes, following the microelectronics revolution triggered by semiconductor technology, a new industrial revolution-the lighting revolution is being bred, and its symbol is the semiconductor Lamps will gradually replace incandescent and fluorescent lamps. Because semiconductor lighting (also known as solid-state lighting) has the advantages of energy saving, long life, maintenance-free, and environmental protection, it is generally believed in the industry that, just like transistors replace electron tubes, semiconductor lamps replace traditional incandescent lamps and fluorescent lamps, which ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L33/02H01L33/00
Inventor 杜国同梁红伟李万程
Owner HUAIAN AUCKSUN OPTOELECTRONICS TECHNOLOGY CO LTD
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