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Light diffuser

A light diffusion and light transmission technology, applied in the field of photolithography, can solve the problems of inability to realize aberration on-line measurement and in-situ measurement, and achieve the effects of easy and precise control, simplification of complexity, and reduction of production costs

Inactive Publication Date: 2011-05-25
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0011] In this way, on-line measurement and in-situ measurement of aberrations cannot be realized on some parts of the pupil plane of the projection objective lens without illumination light

Method used

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Experimental program
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Effect test

Embodiment 1

[0038] Such as figure 1 and figure 2 As shown, in this embodiment, the number of arrays of light diffusion units 10 included in the light diffuser is 9×9, and the light transmission dimensions D1×D2 of the light diffusion units 10 are 1 mm×1 mm.

[0039] The light diffusion unit 10 adopts plano-concave lenses, and two adjacent plano-concave lenses are close to each other.

[0040] The scattering angle α of the light diffuser is determined according to the specific application, and the scattering angle α of the light diffuser is related to the illumination system selected by the lithography equipment and the lithography projection objective. The scattering angle α' of the single plano-concave lens is equal to the scattering angle α of the light diffuser.

[0041] In this embodiment, the scattering angle α of the light diffuser is 7°, that is, the scattering angle α′ of the plano-concave lens is 7°.

[0042] image 3 Shown is a two-dimensional light path diagram of the ligh...

Embodiment 2

[0053] In this embodiment, a plano-concave lens is still used as the light diffusion unit, and the plano-concave lens is still made of fused silica material, and the light transmission size of the plano-concave lens is still 1mm×1mm.

[0054] In this embodiment, the scattering angle α of the light diffuser is 11°, that is, the scattering angle α′ of the plano-concave lens is 11°.

[0055] The determination of the basic optical parameters of the plano-concave lens is as follows:

[0056] (1) Focal length: according to the formula Substitute α'=11°, D=D1=1mm into the above formula to get |f'|=2.5723mm;

[0057] (2) The radius of curvature of the concave surface: according to the lens focal length formula Substituting |f'|=2.5723mm and n=1.56022 into the above formula, r=1.4410mm is obtained.

[0058] The light diffuser of the present invention can firstly optimize the scattering angle according to needs, and then design the basic optical parameters of the light diffusion un...

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Abstract

The invention discloses a light diffuser. The light diffuser is an array device of an optical element, and comprises a plurality of light diffusion units which are distributed in an array. The light diffuser is low in manufacturing cost and has high precision.

Description

technical field [0001] The invention relates to photolithography technology, in particular to a light diffuser used for on-line measurement and in-situ measurement of photolithographic projection object image aberration. Background technique [0002] Photolithography is a technology that uses a selected radiation source (such as an ultraviolet light source) to expose a specified position on a substrate (such as a silicon wafer) coated with a radiation-sensitive substance to manufacture a device. [0003] Under the trend of shrinking CD, the key dimension of semiconductor devices, improving the image resolution of the optical system in lithography equipment is the key. In lithography equipment, the optical system includes an illumination system and a lithography projection objective lens. [0004] The wavelength λ of the light source of the illumination system, the numerical aperture NA of the lithography projection objective lens and the process factor K1 are the factors th...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B3/00G03F7/20
Inventor 蔡燕民
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD