Positive photosensitive composition and permanent resist

A photosensitive composition and resist technology, applied in the direction of photosensitive material processing, optics, light source, etc., can solve the problems of insufficient heat resistance and chemical resistance, and achieve high transparency and excellent resistance to changes over time. Effect

Inactive Publication Date: 2011-06-29
ADEKA CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0007] On the other hand, silicone resins are excellent in transparency, insulation, heat resistance, and chemical resistance, and photoresists using silicone resins as the main agent are known. The heat resistance o

Method used

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  • Positive photosensitive composition and permanent resist
  • Positive photosensitive composition and permanent resist
  • Positive photosensitive composition and permanent resist

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1～11 and comparative example 1～16

[0261] [Examples 1-11 and Comparative Examples 1-16] Preparation of positive photosensitive composition

[0262] The positive photosensitive composition of Examples 1-11 and Comparative Examples 1-16 was prepared after mixing with the ratio shown in [Table 1], and filtering with the filter whose pore diameter is 0.2 micrometers. In addition, additional solvents were added so as to achieve the values ​​in the table.

[0263] [Table 1]

[0264]

[0265] Solvent PGMEA: 1-methoxy-2-propanol acetate

[0266] DAA: diacetone alcohol

[0267] GBL: gamma-butyrolactone

[0268] The following evaluation was performed about the positive photosensitive composition of Examples 1-11 and Comparative Examples 1-16. The results are shown in [Table 2].

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Abstract

A positive photosensitive composition which comprises (A) a silicone resin bearing, in one molecule, at least two groups represented by general formula (1) [wherein R1 is a alkylene group having 1-10 carbon atoms which may have a substituent hydrocarbon group; R2 is a alkyl group having 1-4 carbon atoms; a is a number of 0 or 1 to 4; and b is a number of 1 to 3, with the proviso that the sum of aand b does not exceed 5], (B) a siloxane compound bearing a glycidyl group, (C) a diazonaphthoquinone, and (D) an organic solvent. The permanent resist is produced by applying the positive photosensitive composition to a substrate, exposing the coated substrate to light, and then subjecting the resulting coated substrate to alkali development and then to post-baking at 120 to 350 DEG C.

Description

technical field [0001] The present invention relates to a positive photosensitive composition using a polysiloxane compound, and also to a permanent resist and a method for producing a permanent resist using the positive photosensitive composition. Background technique [0002] With the development of an information society and the spread of multimedia systems, the importance of liquid crystal display devices, organic EL display devices, and the like is gradually increasing. In these display devices, an active matrix substrate including switching elements such as thin film transistors (TFTs) is used for each pixel. [0003] A large number of scanning lines and signal lines crossing the scanning lines through an insulating film are formed on the active matrix substrate. The scanning wiring, signal wiring, insulating film, etc. of the active matrix substrate are formed by repeatedly patterning the conductive film or insulating film formed by the sputtering method, CVD method,...

Claims

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Application Information

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IPC IPC(8): G03F7/075C08G77/16G02F1/1333G03F7/023G03F7/40H01L21/027H01L51/50H05B33/22
CPCG03F7/0233H05B33/22C08G77/18H05B33/10C08G77/16G03F7/40G03F7/0757
Inventor 斋藤诚一森田博竹之内宏美小林纯尾见仁一
Owner ADEKA CORP
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