Device and method for generating low-energy high-density plasma by multi-level ionization
A plasma, low-energy technology, applied in the field of plasma, can solve the problem of increasing the number of arrays, and achieve the effects of high electron density, low power consumption, and improved efficiency and quality
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0022] Combine below figure 1 , figure 2 , image 3 , the present invention is described in detail:
[0023] like figure 1 As shown, a stable flow of gas is passed into the device, and the gas passes through each discharge stage of the device in turn, among which six needle-point electrodes of the second stage are used as an example to illustrate.
[0024] First, the flow rate of the device is 5-50m 3 / h gas and turn on the first stage high-frequency high-voltage alternating power switch 1, the gas passes through such as figure 2 In the circular channel shown, the six needle-point electrodes 6 and the metal rod electrodes 7 respectively form a discharge circuit under the action of six first high-frequency high-voltage power supplies 2 (the peak voltage of this level of power supply is not lower than 6kV, and the frequency is not lower than 20kHz), so that The gas passing through the first-stage discharge electrode is initially ionized under the action of a high-freque...
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com