Method and device for carrying out electrolytic etching on metal plate

Abstract

The invention discloses a method and device for carrying out electrolytic etching on a metal plate. The method comprises the following steps: putting a metal plate onto a delivery roll, and delivering to an electrolysis region; arranging at least one negative electrode above the electrolysis region to serve as an upper electrode, and arranging at least one positive electrode below the electrolysis region to serve as a first lower electrode, wherein the upper electrode and the first lower electrode are staggered in the vertical direction; injecting electrolyte into the clearance between the upper surface of the metal plate and the negative electrode, and simultaneously injecting electrolyte into the clearance between the lower surface of the metal plate and the positive electrode; and applying a voltage to conduct the positive electrode and the negative electrode through the electrolyte and the metal plate, wherein the discharging part is provided with an ash-removing negative electrode which is used as a second lower electrode to carry out ash-removing electrolytic treatment on the lower surface of the metal plate. The device comprises a framework, a motor, a transmission gear, the delivery roll, the positive electrode and the negative electrode, wherein at least one ash-removing negative electrode is arranged at the discharging side of the positive electrode close to the discharging part of the metal plate on the framework. The invention can be used for carrying out ash-removing treatment on the metal plate in the electrolytic etching process, and has a reasonable structure.

Description

technical field [0001] The invention relates to a method and a device for performing electrolytic etching on a metal plate on a passing conveying device. Background technique [0002] The existing continuous electrolytic etching methods and devices for metal plates do not have the process and function of performing electrolytic treatment on metal plates. For example, the patent document of Chinese invention patent application number 200910026641. The method and device described herein provide a method and device for electrolytically etching pictures and texts on a metal plate that is less prone to short circuit and has high etching efficiency. When using this method and device to process the metal plate, due to the cathode adsorption effect of the metal plate during the electrolysis process, the reverse side and / or part of the front side of the metal plate will absorb black hanging ash, which seriously affects the product. The appearance of the product reduces the quality o...

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Problems solved by technology

[0002] The existing continuous electrolytic etching methods and devices for metal plates do not have the process and function of performing electrolytic treatment on metal plates. For example, the patent document of Chinese invention patent application number 200910026641. The method and device of this paper provide a method and device for electrolytic etching of metal plates that are not prone to short circuits and have high etching efficiency.

When using this method and device to process the metal plate, due to the cathode adsorption effect of the metal plate during the electrolysis process, the reverse side and / or part of the front side of the metal plate will absorb black hanging ash, which seriously affects the product. Appearance, reducing product quality

In addition, when the electrolytic roughening treatment of the entire metal plate is carried out, and when the electrolytic polishing process is performed on the entire metal plate, the reverse side of the metal plate will also absorb black hanging dust, which seriously affects the appearance of the product

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