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Method for recycling cerium oxide abrasive

By adding a strong alkali solution and sodium fluoride to the waste slurry of cerium oxide abrasives, the Si-OH layer and fine powder are removed, and the recycling of cerium oxide abrasives is realized, which solves the problems of reduced polishing efficiency and high production costs, and prolongs the service life of the abrasives. life cycle and reduced production costs.

Active Publication Date: 2011-09-21
LG CHEM LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, as described above, the unit price of cerium oxide abrasives is expensive, thus leading to an increase in the production cost of products using glass materials

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0041] According to Example 1 of the present invention, 6 grams of NaOH, 1 gram of NaF and 80 grams of cerium oxide abrasive were put into 1000 cubic centimeters of deionized water, and then stirred for 2 hours. In this case, the resulting solution was maintained at 90°C. After 5 minutes, the supernatant was removed and the pellet was sampled for inspection. The composition of the precipitate was measured using an energy dispersive X-ray (EDX) analyzer, and the results are shown in Table 1.

Embodiment 2

[0043] According to Embodiment 2 of the present invention, 6 grams of NaOH, 1 gram of NaF, 1.2 grams of Na 2 CO 3 and 80 g of cerium oxide abrasive were put into 1000 cm3 of deionized water, and stirred for 2 hours. In this case, the resulting solution was kept at 90°C. After 5 minutes, the supernatant was removed and the pellet was sampled for inspection. The composition of the precipitate was measured using an energy dispersive X-ray (EDX) analyzer, and the results are shown in Table 1.

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Abstract

Disclosed is a method for recycling a cerium oxide abrasive. The method may include adding a strong alkali solution to a slurry waste of the cerium oxide abrasive, adding sodium fluoride to the slurry waste, and separating a cerium oxide particle included in the slurry waste from other kinds of particles.

Description

[0001] Cross References to Related Applications [0002] This application claims priority from Korean Patent Application No. 10-2010-0022391 filed in Korea on Mar. 12, 2010, the contents of which are incorporated herein by reference in their entirety. technical field [0003] The present invention relates to a method of recycling cerium oxide abrasives, and more particularly to a method of efficiently recovering cerium oxide abrasives used in polishing glass materials such as glass substrates or photomasks to reuse the abrasives. Background technique [0004] The purpose of polishing is to planarize the surface of various semiconductor substrates, including glass substrates or photomasks, or thin films formed on the semiconductor substrates. Generally, abrasives are used in the polishing process to improve polishing efficiency. A variety of abrasives can be used, of which cerium oxide abrasives are widely used. [0005] Cerium oxide (CeO 2 ) is a high-performance ceramic...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B24B57/02B24B57/00
CPCC09G1/02C09K3/14B24B55/12
Owner LG CHEM LTD
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