117results about How to "Reduce polishing costs" patented technology

An apparatus for polishing a substrate is provided. The apparatus includes: a rotatable polishing table supporting a polishing pad; a substrate holder configured to hold a substrate and press the substrate against a polishing surface of the polishing pad on the rotating polishing table so as to polish the substrate; a pad-temperature detector configured to measure a temperature of the polishing surface of the polishing pad; a pad-temperature regulator configured to contact the polishing surface to regulate the temperature of the polishing surface; and a temperature controller configured to control the temperature of the polishing surface by controlling the pad-temperature regulator based on information on the temperature of the polishing surface detected by the pad-temperature detector.

The invention relates to a surface pre-treatment system combining four aluminum alloy working grooves into a whole for full recovery of medicament and zero emission of wastewater. The surface pre-heated system comprises a No.1 four-in-one sand surface groove, a No.2 matte tank, a No.3 water washing interception groove, a No.4 water washing interception groove, a No.5 water washing interception groove, a No.6 water washing material waiting groove, a No.7 oxidation groove and a No.8 water washing interception groove, as well as a matching slag pumping system, a medicament recovery system, a water circulation purification processing system and a reverse water replenishing neutralization system. As the four working grooves are combined into a whole, and the technical scheme is simultaneously equipped with the full recovery of the medicament and the zero emission of the wastewater, the pollution of fluorine and ammonium in the oxidation pre-treatment of an aluminum alloy anode can be effectively solved, the full recovery of the wastewater in the aluminum alloy surface pre-treatment can be realized, the pollution control of a company can be greatly reduced, and the production cost can be reduced.

The invention belongs to the technical field of optical element machining, and particularly discloses an edge error control method in optical lens small grinding head optical machining. The edge errorcontrol method comprises specific steps that firstly, a workpiece is measured to obtain a surface shape error, an appropriate quadratic term is added to the surface removing amount for adjustment, and the edge machining difficulty is lowered; meanwhile, a polishing path is abstracted to discrete sampling points, and a removing function of each sampling point is calculated according to a removingfunction model; then, the residence time is solved through a space variation deconvolution algorithm; and finally, a control program is generated according to the polishing path and the residence time, and polishing is carried out on the workpiece. The removing function changing along with the position is adopted to solve the residence time, and the removing amount of the edge part can be precisely controlled; the non-linear deconvolution algorithm can adapt to the shifting removing function; and by means of the surface shape adjusting technology, the convergence difficulty of the edge error is lowered to the maximum extent. According to the edge error control method, the requirement for the control precision of a polishing system is relatively low, and therefore the small grinding head polishing cost can be reduced, and the machining efficiency is improved.

This invention pertains to a composite of AlON and a germanate glass, and to a process for bonding AlON to the glass. The composite includes AlON and glass bonded together and having transmission in the visible and mid-infrared wavelength region. The process includes the step of heating them together above the softening temperature of the glass, the composite having excellent, i.e., typically in excess of about 60%, transmission in the 0.4-5 wavelength region.

The invention provides a rigid endoscope relay optical system that can be fabricated at lower costs while its brightness is kept intact by reducing parts count. The rigid endoscope optical system has an elongate insert and is adapted to implement image transfer using relay lenses Re1 to Re7. The relay lenses Re1 to Re7 each have at least two rod lenses and satisfy nd>2, where nd stands for the refractive index on d-line basis of each rod lens in the relay lens.

The invention relates to a novel production method for a mixed grinding material. The method comprises the following steps: mixing zirconium silicate and alumina; carrying out ball milling on the mixture so as to obtain mixed micro-powder; putting the mixed micro-powder, water and a dispersant into a sorting barrel and standing the mixture for settlement after stirring; carrying out sorting, wherein two sub-steps are included, namely, a) sucking out a slurry on the upper layer of the sorting barrel with a siphon, adding clear water to the sorting barrel until the mixture reaches the initial liquid level before siphoning, and carrying out stirring, settling and siphoning so as to obtain particles of a grade, and b) adding the dispersant and clear water into the sorting barrel until the mixture reaches the initial liquid level before siphoning and repeating the steps of stirring, settling and siphoning so as to obtain particles of another grade; drying the obtained particles with different grades so as to obtain a finished product. The mixed grinding material produced in the invention enables damage of micro-powder to the surface of a ground material in grinding to be substantially reduced and plays a very critical role in improving the quality of surface polishing of an object and in reducing polishing cost.

The invention relates to a polishing agent, in particular to a stainless steel material polishing agent and a preparation method thereof. Each liter of the polishing agent solution is composed of 5-9 g/L of ferric trichloride, 80-150 ml/L of concentrated hydrochloric acid, 30-60 ml/L of concentrated nitric acid, 18-26 g/L of emery, 20-40 ml/L of tetra-polyricinoleate, 12-18 ml/L of organic polymeric tribasic carboxylic acid, 5-12 ml/L of triethanolamine, 30-80 ml/L of ethylene glycol, 10-25 ml/L of composite additives, and the balance water. The polishing agent provided by the invention is environmentally friendly, efficient and convenient to use.

The invention relates to a chemical polishing agent for stainless steel product surface polishing, a preparation method and a polishing method thereof. The chemical polishing agent is prepared by adding 13-20 g/L of ammonium bifluoride, 85-110 mL/L of nitric acid, 110-130 mL/L of phosphoric acid, 140-160 mL/L of hydrochloric acid, 20-30 g/L of sodium chloride, 85-95 mL/L of hydrogen peroxide, and 25-40 mL/L of a composite additive to water, wherein the composite additive contains 4-6 g/L of hexamethylenetetramine, 10-15 g/L of polyethylene glycol, 10-12 g/L of urea, 5-7 g/L of sulfosalicylic acid, and 4-8 g/L of an OP emulsifying agent. According to the present invention, surface flatness and glossiness of a stainless steel work-piece are increased, consumption of a large amount of electric energy is not required, chromic anhydride toxic substances are not generated, and waste water treatment requirements are reduced.

Provided is a package structure including a substrate, N dies, N first pads, N vertical wires, and a second pad. The N dies are stacked alternatively on the substrate, so as to form a multi-die stack structure. The N dies include, from bottom to top, first to N^th dies, wherein N is an integer greater than 1. The first die is a bottom die, and the N^th die is a top die. The first pads are disposed on an active surface of the dies respectively. The vertical wires are disposed on the first pads respectively. The second pad is disposed on the top die.

A polishing pad which ensures that a work can be easily removed from the polishing pad surface after polishing, the amount of a polishing liquid used for polishing can be reduced, and the production cost of the polishing pad can be lowered. A first polishing pad (1) for polishing a work is provided with a plurality of slots (11) piercing the first polishing pad (1) in a sa direction, the length in the longitudinal direction of the slots (11) being preferably not less than 20 mm, the pitch in the width direction of the slots (11) being preferably less than 100 mm, and small holes (not shown) may be provided in addition to the slots (11).

The invention provides a chemical mechanical polishing liquid, which contains water, abrasive particles with negative charges on the surface, a compound capable of producing silver ions, a compound capable of producing sulfate ions, and a peroxide. According to the present invention, by changing the charge on the surface of the silica abrasive particles, the stability of the polishing liquid is significantly improved, the polishing stability is further improved, the polishing efficiency is improved, and the polishing cost is reduced.

A novel polishing machine comprises a pedestal, a polishing mechanism and a power distribution/control device, wherein the pedestal is provided with a straightening device, the polishing mechanism and a material receiving disk; an emptying risk is arranged behind the pedestal; the polishing mechanism consists of a spindle, a spindle motor, a pair of polishing motors, a pair of polishing wheels and a rotating armature; the spindle motor is arranged in the pedestal and drives the spindle to rotate; the middle of the spindle is provided with a rotating frame; the spindle drives the rotating frame to rotate; the two ends of the spindle pass through bearing seats; the two bearing seats are fixed on the pedestal; the rotating frame is sleeved with a pair of polishing motor mounting seats; the polishing motor is arranged in the polishing motor mounting seat and drives the polishing wheel to rotate; the back end of the spindle is provided with the rotating armature which rotates synchronously with the spindle; the rotating armature supplies power to the polishing motor; and the power distribution/control device supplies power to the rotating armature and the spindle motor. The machine solves the problem that a non-rotatable slender piece cannot be polished mechanically.