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Array substrate and manufacturing method thereof, and liquid crystal display

A manufacturing method and array substrate technology, applied in semiconductor/solid-state device manufacturing, instruments, electric solid-state devices, etc., can solve the problems of increasing the number of mask patterning processes, reducing production efficiency, and complicated processes, so as to simplify the production process, The effect of small data line spacing and efficient preparation of array substrates

Inactive Publication Date: 2013-10-16
BOE TECH GRP CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Although this technology can reduce the line width difference to reduce the spacing of data lines, it increases the number of mask patterning processes, making the process complex, reducing production efficiency, and increasing costs.

Method used

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  • Array substrate and manufacturing method thereof, and liquid crystal display
  • Array substrate and manufacturing method thereof, and liquid crystal display
  • Array substrate and manufacturing method thereof, and liquid crystal display

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0040] image 3 The flow chart of the manufacturing method of the array substrate provided in Embodiment 1 of the present invention, the manufacturing method includes the process of forming gate lines, gate electrodes, active layers, data lines, source electrodes, drain electrodes and pixel electrode patterns in the pixel area and simultaneously The process of forming gate lines and data line patterns in the interface area, the method of this embodiment is specifically a method for preparing an array substrate using a four-time mask patterning process, including the following steps:

[0041] Step 301, depositing a gate metal thin film on the base substrate 1, using a monotone mask, etching the gate metal thin film through a patterning process to form a pattern including gate lines 2 and gate electrodes 3; the gate metal thin film can be made of a non-transparent Made of photoconductive materials, such as aluminum, neodymium, molybdenum and other metals.

[0042] Step 302: For...

Embodiment 2

[0060] Figure 8 It is a partial flow chart of the manufacturing method of the array substrate provided in Embodiment 2 of the present invention. Through the patterning process, the passivation layer film above the drain electrode is etched away to form the pattern of the passivation layer via hole, and the interface is etched away at the same time. The specific steps for the passivation layer film and the remaining active layer film corresponding to the part of the reserved area in the region are as follows:

[0061] A two-tone mask is used for the patterning process, and the passivation layer film above the drain electrode is etched by the first etching to form a passivation layer via hole pattern, and then etched by the second etching The passivation layer film and the remaining active layer film corresponding to the part of the reserved area in the interface area include the following steps:

[0062] Step 801, forming a passivation layer film 90 on the base substrate 1 af...

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Abstract

A manufacturing method of an array substrate comprises forming gate lines, data lines, pixel electrodes, and gate electrodes, active layer members, source electrodes, drain electrodes of thin film transistors (TFTs) in pixel units in a display region and forming the gate lines and the data lines in a pad region. A process of forming the data lines, the active layer members, the source electrodes and the drain electrodes in the display region and simultaneously forming the data lines in the pad region is performed.

Description

technical field [0001] The invention relates to liquid crystal display technology, in particular to an array substrate, a manufacturing method thereof and a liquid crystal display. Background technique [0002] A liquid crystal display is a commonly used flat panel display at present, and a thin film transistor liquid crystal display (ThinFilm Transistor Liquid Crystal Display, TFT-LCD for short) is a mainstream product in the liquid crystal display. High resolution and low power consumption are the development trend of TFT-LCD at present, and these all put forward higher requirements for the manufacturing process of TFT-LCD. Among them, the use of metal materials with lower resistivity as data line materials is one of the development trends. For example, the existing TFT-LCD uses aluminum / molybdenum metal stacks to make data lines. In order to reduce power consumption, it is necessary to use aluminum / neodymium (AlNd) laminate, pure aluminum (Al) or pure copper (Cu) and oth...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/77H01L27/02G02F1/1362
CPCG02F1/136286G02F1/136236H01L27/1214H01L27/124H01L27/1288
Inventor 谢振宇龙春平
Owner BOE TECH GRP CO LTD
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