Heating method for producing similar single crystal silicon ingot materials by using casting method
A technology of single crystal silicon ingot and heating method, which is applied in the heating of silicon ingot chemical material and the heating field of similar single crystal silicon ingot chemical material produced by casting method, which can solve the problems of inability to grow similar single crystal silicon ingot and process failure, so as to improve production efficiency , to ensure the effect of production safety
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Embodiment 1
[0025] Casting method produces similar single crystal silicon ingot chemical material heating method, in the process of growing similar single crystal (quasi-single crystal) in the ingot furnace, during the heating process of the ingot furnace from room temperature, the following controls are carried out as required:
[0026] aBy controlling the heating power and heating time, make ΔT=TC1-TC2 when TC1≤1170 degrees Celsius, ΔT≤800 degrees Celsius; other ΔT range values can also be set as required.
[0027] b When TC1 reaches > 1170 degrees Celsius, by controlling the heating power, heating time and the position of the heat insulation cage, make 150 degrees Celsius ≤ ΔT ≤ 400 degrees Celsius; other ΔT range values can also be set as required.
[0028] c When TC1 reaches the predetermined maximum temperature, it enters the stage of grasping the seed crystal.
[0029] Wherein, the predetermined maximum temperature refers to 1420-1440 degrees Celsius (such as 1420 degrees Celsi...
Embodiment 2
[0031] Casting method produces similar single crystal silicon ingot chemical material heating method, in the process of growing similar single crystal (quasi-single crystal) in the ingot furnace, during the heating process of the ingot furnace from room temperature, the following controls are carried out as required:
[0032] aBy controlling the heating power and heating time, make ΔT=TC1-TC2 when TC1≤1170 degrees Celsius, ΔT≤700 degrees Celsius; other ΔT range values can also be set as required.
[0033] b When TC1 reaches >1170 degrees Celsius, by controlling the heating power and heating time and the position of the heat insulation cage, make 170 degrees Celsius ≤ ΔT ≤ 380 degrees Celsius; other ΔT range values can also be set as required.
[0034] c When TC1 reaches the predetermined maximum temperature, it enters the stage of grasping the seed crystal.
[0035] Wherein, the predetermined maximum temperature refers to 1580-1600 degrees Celsius (such as 1600 degrees Cel...
Embodiment 3
[0037] Casting method produces similar single crystal silicon ingot chemical material heating method, in the process of growing similar single crystal (quasi-single crystal) in the ingot furnace, during the heating process of the ingot furnace from room temperature, the following controls are carried out as required:
[0038] aBy controlling the heating power and heating time, make ΔT=TC1-TC2 when TC1≤1170 degrees Celsius, ΔT≤600 degrees Celsius. Other ΔT range values can also be set as required.
[0039] b When TC1 reaches > 1170 degrees Celsius, by controlling the heating power, heating time and the position of the heat insulation cage, make 190 degrees Celsius ≤ ΔT ≤ 360 degrees Celsius. Other ΔT range values can also be set as required.
[0040] c When TC1 reaches the predetermined maximum temperature, it enters the stage of grasping the seed crystal.
[0041] Wherein, the predetermined maximum temperature refers to 1500-1520 degrees Celsius (such as 1500 degrees Cel...
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