Ion exchange resin arsenic removal method for acidic etching liquid, resin regeneration method and treatment system thereof
A technology of ion exchange resin and acid etching solution, applied in the direction of ion exchange water/sewage treatment, etc., can solve the problems of high cost of resin regeneration, poor arsenic removal effect, difficult resin regeneration, etc., to achieve low cost, easy control, Easy to clean effect
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[0037] The present invention will be described in further detail below in conjunction with each accompanying drawing.
[0038] A method for removing arsenic by ion exchange resin used in acidic etching solution is a pretreatment process for producing basic copper chloride from printed circuit board acidic etching waste solution, comprising the following steps:
[0039] A, fresh leaching resin 941 type is packed in ion exchanger, and the chemical name category of this leaching resin is strongly acidic styrene series cation exchange resin;
[0040] B. see figure 1 pumping the acidic etching waste liquid of the printed circuit board to be treated into the ion exchanger from the inlet of the ion exchanger for arsenic removal treatment, controlling the flow rate of the acidic etching waste liquid in the ion exchanger, Let it flow in the ion exchanger for 20 to 40 minutes, and then flow out from the outlet of the ion exchanger to obtain the printed circuit board acidic etching wast...
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