Method for preparing anti-fingerprint film for touch screen

Abstract

The invention relates to the technical field of optoelectronic device manufacture, in particular to a preparation method for improving the attachment force of an anti-fingerprint film and a toughened glass substrate in the preparation process of the anti-fingerprint film for a capacitance type touch screen. The preparation method comprises the following steps that: step 1, the clean toughened glass substrate is placed into a plasma enhanced chemical vapor deposition (PECVD) chamber, and the glass substrate is etched and activated through O2 and Ar glow discharge; step 2, SiOx is formed through high-temperature pyrolysis of siloxane, and a SiOx buffer layer is deposited on the surface of the toughened glass substrate after the ion cleaning and the etching; step 3, through the O2 glow discharge, the SiOx buffer layer is etched, the SiOx with poor attachment force is peeled off, O is supplemented, and a SiO2 buffer layer is formed; and step 4, a thermal evaporation method is used for depositing the anti-fingerprint film for the touch screen on the surface of the SiO2 buffer layer formed after the O2 glow discharge.

Description

technical field [0001] The invention is used in the technical field of optoelectronic device manufacturing, and in particular relates to a preparation method for improving the adhesion between the anti-fingerprint film and a strengthened glass substrate in the preparation process of the anti-fingerprint film for a capacitive touch screen. Background technique [0002] Anti-fingerprint and anti-fingerprint films for touch screens have good hydrophobicity and oleophobicity. The permanent topic of the industry. Add a layer of SiO between the anti-fingerprint film for touch screen and glass substrate 2 The buffer layer can improve the coating adhesion between the anti-fingerprint film for the touch screen and the glass substrate. The commonly used methods for preparing the buffer layer and the anti-fingerprint film for touch screen are PVD method and CVD method. Among them, the deposition speed of PVD technology is slow and the adhesion of the coating is insufficient, while th...

AI Technical Summary

Problems solved by technology

[0003] Using PECVD to traditional etching, SiO plating 2 Buffer layer and anti-fingerprint film for touch screen three-step process method, SiO coating on the surface of glass substrate 2 When buffer layer and anti-fingerprint film, it is easy to cause SiO 2 The surface smoothness of the buffer layer is extremely high, which limits the SiO 2 Coating adhesion between buffer layer and anti-fingerprint film for touch screen

At the same time, with the development of touch technology, the requirements for the adhesion between the anti-fingerprint film for touch screen and the glass substrate coating are getting higher and higher, and the traditional technology is also facing more and more challenges in terms of coating adhesion requirements.

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