Crystal silicon solar battery dry etching clamp

Abstract

A crystal silicon solar battery dry etching clamp belongs to the technical field of solar batteries and adopts the structure that a base plate is connected with a silicon chip stacked base; a first support seat and a fourth support seat are respectively fixed on the two side walls of the silicon chip stacked base through bolts; both a fixed clamp plate and a movable clamp plate are rectangular plates and connected with a first support shaft and a second support shaft respectively, and holes are formed on the opposite angles of the rectangular plates; a central round groove is formed on the inner side contact surface of the fixed clamp plate, and center square groove is formed on the outer side surface of the fixed clamp plate; a center groove is formed on the inner side contact surface of the movable clamp plate; and a bolt rod of an ejector rod is in threaded connection with a ejector rod support, and the top end of the ejector rod is in contact with the movable clamp plate. Due to the above structure, the clamp plate deformation and the uneven stress on the silicon chip caused by force applied to one point are avoided; and a contact surface center chamfer allows the force to bedispersed on the edges of the silicon chips and enables the silicon chip edges to be clamped tightly so as to reduce the stress on the middle areas of the silicon chips. Therefore, the possibility for the etching gas to permeate into the stacked silicon chips is reduced to the maximum degree, and the fragments are reduced; and the silicon chip stacked base allows the stack of the silicon chips tobe more concise, and the fraction between the silicon chips is reduced.

Description

technical field [0001] The invention relates to a fixture for dry etching of crystalline silicon solar cells, belonging to the technical field of crystalline silicon solar cells. Background technique [0002] The meaning of crystalline silicon solar cell is: a power generation device that uses crystalline silicon as a material to convert light energy into electrical energy. [0003] Dry etching means: using gaseous reactants to perform reactive etching on the edge of the silicon wafer. [0004] Facing the global energy crisis, solar photovoltaic power generation technology has become a new development hotspot in the semiconductor industry. The manufacture of crystalline silicon solar cells is divided into processes such as texturing, diffusion, plasma etching, PSG cleaning, PECVD coating, screen printing, and sintering. The diffusion process will cause n-type junction layers to appear on the edge of the silicon wafer, which will cause the positive and negative electrodes of...

AI Technical Summary

Problems solved by technology

[0007] a) The force application method in the prior art is two-point force application, and the two-point force application may be uneven, as well as the uneven force on the surface of the silicon wafer, which affects the clamping effect of the edge of the silicon wafer;

[0008] b) The force-bearing surface of the silicon wafer is flat, prone to uneven force, and easy to deform, causing the edge of the silicon wafer to not be clamped tightly;

[0009] c) The stacking process of silicon wafers is complicated to operate, and it is prone to wear and tear on the PN junction on the surface of silicon wafers

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