Method and system for producing monosilane
A technology of monosilane and equipment, which is applied in the field of preparation of monosilane, can solve problems such as the limitation of catalyst thermal stability, and achieve the effect of speed improvement
Active Publication Date: 2014-07-23
SCHMID SILICON TECH
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Problems solved by technology
However, in practice, due to the limited thermal stability of the catalyst, compromise measures must be taken.
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[0032] Other features of the present invention are given by the following description of preferred embodiments in conjunction with the dependent claims. In the embodiment according to the present invention, each feature is realized individually or in combination with one another. The described preferred embodiments are only used to illustrate and better understand the present invention, but do not limit the present invention in any way.
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The invention relates to a plant for the preparation of monosilane comprising a reaction tower (100) with a trichlorosilane feed (101) and a discharge for the formed silicon tetrachloride pipe (102), and at least one condenser (103), through which the monosilane produced can be discharged from the reaction tower, wherein the reaction tower contains at least two reaction zones (104; 105) for reaction / distillation, the The reaction zones operate at different temperatures and contain different catalytic solids. Furthermore, the invention relates to a process for the preparation of monosilane by catalytic disproportionation of trichlorosilane, in which process the disproportionation is carried out in at least two reaction zones (104; 105) for reaction / distillation, said The reaction zones operate at different temperatures and contain different catalytic solids.
Description
Technical field [0001] The invention relates to a method for preparing monosilane (SiH 4 ) Equipment, the equipment includes a reaction tower and the reaction tower with a trichlorosilane feed pipe (Zulauf) and a silicon tetrachloride (SiCl 4 ) And at least one condenser, through which the prepared monosilane can be discharged from the reaction tower. In addition, the present invention also relates to a method for preparing monosilane through the catalytic disproportionation reaction of trichlorosilane. Background technique [0002] High-purity silicon is usually prepared in a multi-step process from metallurgical silicon that can have relatively high impurity content. In order to purify metallurgical silicon, for example, metallurgical silicon can be converted into a trihalosilane, for example, trichlorosilane (SiHCl 3 ), and then thermally decomposed into high-purity silicon. For example, DE 29 19 086 describes such a process. Alternatively, as described in DE 33 11 650, high...
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IPC IPC(8): B01D3/00C01B33/04B01J35/00
CPCB01D3/009C01B33/043Y02P20/10B01D3/32
Inventor A·佩特里克C·施密德J·哈恩
Owner SCHMID SILICON TECH