Spray head

A technology of shower head and yttrium oxide, applied in the field of shower head, can solve problems such as aluminum corrosion, thinning of shower head thickness, pollution, etc., and achieve the effect of enhancing service life and strong anti-etching ability

Inactive Publication Date: 2012-06-27
ADVANCED MICRO FAB EQUIP INC CHINA
View PDF3 Cites 10 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The substrate of the existing shower head is generally aluminum, but aluminum is easily corroded in the plasma environment, resulting in a short service life of the shower head
In response to this problem, in the prior art, the outer surface of the substrate is covered with a layer of aluminum oxide (Al 2 o 3 ), however, because the surface of the shower head is in contact with the plasma when it is in use, and the surface of the alumina is easy to react with the fluorine-containing plasma to form aluminum fluoride particles, which gradually accumulate to form large particles, which fall on the waiting surface Etching the wafer will cause pollution, so alumina is not the preferred material for the sho

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Spray head
  • Spray head
  • Spray head

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0024] The present invention uses yttrium oxide, a material with strong etching resistance, to cover the surface of silicon or silicon carbide, thereby enhancing the service life of the shower head.

[0025] In order to make the above objects, features and advantages of the present invention more comprehensible, specific implementations of the present invention will be described in detail below in conjunction with the accompanying drawings. Since the emphasis is placed upon illustrating the principles of the invention, the drawings are not drawn to scale.

[0026] figure 1 Shown is a schematic diagram of the shower head provided in this embodiment. This sprinkler includes:

[0027] Spray head substrate 11;

[0028] The shower head substrate 11 is covered with a silicon or silicon carbide layer 12;

[0029] The surface of the silicon or silicon carbide layer 12 is covered with an yttrium oxide layer 13 .

[0030] The material of the shower head substrate 11 is generally me...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
Thickness rangeaaaaaaaaaa
Thickness rangeaaaaaaaaaa
Thicknessaaaaaaaaaa
Login to view more

Abstract

The invention provides a spray head which comprises a spray head matrix. A silicon or silicon carbide layer is covered on the spray head matrix, wherein an yttrium oxide layer is covered on the surface of the silicon or silicon carbide layer. The spray head provided by the invention has strong etching resistance capability and long service life.

Description

technical field [0001] The invention relates to the field of semiconductor manufacturing, in particular to a shower head. Background technique [0002] In recent years, in the field of semiconductor manufacturing, shower heads for supplying air in a shower-like manner to substrates such as semiconductor wafers have been used. For example, in plasma etching processing equipment, a mounting table for mounting a substrate is provided in the processing chamber, and a shower head is provided at a position opposite to the mounting table, and a plurality of gas ejection holes are provided on the surface of the shower head. , to generate plasma by supplying gas in a shower. In the above-mentioned plasma processing apparatus, since plasma is generated in the processing chamber, the temperature of the showerhead is generally high. [0003] The substrate of the existing shower head is generally aluminum, but aluminum is easily corroded in the plasma environment, resulting in a short ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): H01J37/32H01J37/02
Inventor 贺小明倪图强彭帆徐朝阳
Owner ADVANCED MICRO FAB EQUIP INC CHINA
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap