Chemical-mechanical polishing liquid
A chemical mechanical and polishing liquid technology, applied in the direction of polishing compositions containing abrasives, etc., to achieve good stability and small scratches
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[0009] The present invention will be further explained by the method of examples below, and the present invention is not limited to the scope of the described examples.
[0010] Table 1 shows the formulas of Examples 1-9 of the chemical mechanical polishing liquid of the present invention and the comparative examples. According to the formula in the table, the ingredients are simply and uniformly mixed, the balance is water, and then potassium hydroxide, ammonia and nitric acid are used. Adjusting to a proper pH value, the polishing liquid of each embodiment can be prepared.
[0011] Table 1 Chemical mechanical polishing liquid examples 1-9 and comparative examples of the present invention
[0012]
[0013] Using the polishing liquid of Comparative Example 1 and Examples 1-7 of the present invention, the blank HDP-Oxide wafer and the blank Si 3 N 4 The wafer is polished. Polishing conditions: the polishing pad is PPG 14', the down pressure is 4psi, the rotating speed is polishing di...
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