Lithography machine chemical interface system and application thereof

Abstract

The invention provides a lithography machine key code system. Hardware is improved, a detachable key ring is arranged on the top of a long tube at the end of a machine table; the key ring is provided with protrusions same as the originally designed built-in protrusions; the thickness of the built-in protrusions is increased; and the chemical bottle opening is provided with two rings with consistent notches, namely an upper ring and a lower ring, wherein the upper ring can rotate. When the chemicals are replaced, the key ring is detached and inserted into the upper ring, when the protrusions of the key ring are matched with the notches of the upper ring, the upper ring can be rotated by using the key ring, so that the notches of the upper ring are superposed with those of the lower ring; and the key ring is removed, the long tube at the end of the machine table can be inserted into a novel chemical bottle so as to finish mounting novel chemicals.

Description

technical field [0001] The invention relates to a photolithography machine chemical interface, in particular to a photolithography machine chemical interface system capable of ensuring correct chemical replacement, and a method for using the interface system to perform chemical replacement. Background technique [0002] Photolithography technology is a process technology that uses optical-chemical reaction principles and chemical and physical etching methods in the manufacture of integrated circuits to transfer circuit patterns to single crystal surfaces or dielectric layers to form effective graphics windows or functional graphics; photolithography technology is One of the core processes of integrated circuit manufacturing technology. With the extension of integrated circuit manufacturing to smaller dimensions, lithography technology has developed from conventional optical technology to new technologies such as electron beams, X-rays, micro-ion beams, and lasers; the use of...

AI Technical Summary

Problems solved by technology

[0006] Aiming at the problem that mistakes are prone to occur in the process of changing chemicals in lithography machines, the present invention provides a new chemical interface system for lithography machines and a method for changing chemicals using the interface system, which can Confirm whether the chemicals are correct, and effectively prevent errors before installing and replacing chemicals

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