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Double-faced parallel symmetric silicon beam mass block structure and method for preparing same

A parallel symmetry, mass block technology, applied in microstructure technology, microstructure devices, manufacturing microstructure devices, etc., can solve the problems of difficult symmetrical beam structure size, complex process, poor control symmetry, etc., to reduce cross-sensitivity, process The effect of simple, improved resistance to lateral and torsional shocks

Active Publication Date: 2012-08-22
SHANGHAI INST OF MICROSYSTEM & INFORMATION TECH CHINESE ACAD OF SCI
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0009] In view of the above-mentioned shortcomings of the prior art, the object of the present invention is to provide a double-sided parallel symmetrical silicon beam-mass structure and its preparation method, which are used to solve the complex process, difficult control of the size of the symmetrical beam structure and the symmetrical sex problem

Method used

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  • Double-faced parallel symmetric silicon beam mass block structure and method for preparing same
  • Double-faced parallel symmetric silicon beam mass block structure and method for preparing same
  • Double-faced parallel symmetric silicon beam mass block structure and method for preparing same

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Embodiment 1

[0066] Such as figure 1 As shown, the present invention provides a double-sided parallel symmetrical silicon beam-mass structure, comprising:

[0067] A support frame 300 , a mass block 500 and a plurality of cantilever beams 400 .

[0068] The support frame 300 is arranged in the acceleration sensor, and its frame body is in a rectangular structure. The mass block 500 conforms to the frame to form a rectangular cubic structure and is arranged in the support frame 300 , and each side of the mass block 500 has trapezoidal grooves 502 .

[0069] The cross-section of the cantilever beam 400 is pentagonal, the cantilever beam 400 extends along the horizontal edge 501 of the mass block 500 and is connected to the support frame 300, each of the cantilever beams 400 is symmetrically distributed on the The four top corners 503 and four bottom corners 504 of the mass block 500, and the cantilever beam 400 distributed at one top corner 503 of the mass block 500 and the cantilever beam...

Embodiment 2

[0074] Such as figure 2 As shown, the present invention provides a double-sided parallel symmetrical silicon beam-mass structure, the difference between this structure and the structure in Embodiment 1 is:

[0075] A pair of parallel cantilever beams 400 are respectively distributed on the top corners 503 of the mass block 500 and the corresponding bottom corners 504, and a pair of cantilever beams 400 extend from each horizontal edge 501 of each side of the mass block 500. , there are 8 cantilever beams 400 in this case, which are parallel and symmetrically distributed on the upper and lower surfaces of the proof mass 500 .

[0076] Other structures are the same as those in Embodiment 1, and will not be repeated in this embodiment.

Embodiment 3

[0078] Such as image 3 As shown, the present invention provides a double-sided parallel symmetrical silicon beam-mass structure, the difference between this structure and the structure in Embodiment 1 is:

[0079] Each top corner 503 of the mass block 500 and its corresponding bottom corner 504 are respectively intersected with two pairs of parallel cantilever beams 400 , and the horizontal edge 501 of each side of the mass block 500 extends with two For the cantilever beams 400 , there are 16 cantilever beams 400 in this case, which are parallel and symmetrically distributed on the upper and lower surfaces of the proof mass 500 .

[0080] Other structures are the same as those in Embodiment 1, and will not be repeated in this embodiment.

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Abstract

The invention provides a double-faced parallel symmetric silicon beam mass block structure and a method for preparing the same, which belong to the field of micro-electronic machinery. The method includes forming a double-faced parallel symmetric beam mass block graphic area on a double-polished silicon wafer (100) by the aid of a double-faced front and back aligned photolithographic process; then performing dry etching and wet anisotropic etching; using surfaces (111) of a cantilever beam as corrosion termination surfaces to automatically stop corrosion to the silicon cantilever beam; and finally forming the double-faced parallel symmetric beam mass block structure. The method for preparing the double-faced parallel symmetric silicon beam mass block is simple in process, the dimensions of the double-faced parallel symmetric beam mass block structure can be accurately controlled, and the manufacturing yield of beam mass block structures is greatly increased. In addition, a prepared device is high in normal symmetry, lateral impact resistance and torsional impact resistance of the device are improved, cross sensitivity is reduced, and the double-faced parallel symmetric silicon beam mass block structure and the method can be applied to structures of various MEMS (micro-electromechanical system) devices such as capacitance type acceleration transducers, resistance type acceleration transducers, micromechanical gyroscopes and the like.

Description

technical field [0001] The invention relates to a double-sided parallel symmetrical silicon beam quality block structure and a preparation method thereof, and belongs to the field of micro-electromechanical systems. Background technique [0002] The double-sided parallel symmetrical beam-mass structure is a very important sensitive structural part in the acceleration sensor, and its preparation process is one of the key processes of the entire sensor. In the beam-mass structure, if the beam is only concentrated on one surface of the proof mass, the center of mass of the proof mass and the beam are not in the same plane, the transverse acceleration will cause the bending of the beam, resulting in high cross-axis sensitivity of the sensor. Therefore, the preparation method of the double-sided parallel symmetrical beam-mass structure is very critical. [0003] Common methods for preparing double-sided parallel symmetrical beam-mass structures include: heterogeneous self-stoppi...

Claims

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Application Information

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IPC IPC(8): B81B3/00B81C1/00
Inventor 车录锋周晓峰熊斌林友玲王跃林
Owner SHANGHAI INST OF MICROSYSTEM & INFORMATION TECH CHINESE ACAD OF SCI
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