Imaging spectrum filter and preparation technique thereof

Abstract

The invention relates to an imaging spectrum filter, which comprises a substrate and pixel layers. The imaging spectrum filter is characterized in that the front surface and the back surface of the substrate are covered by the pixel layers, and the pixel layers on the front surface and the back surface are interference film systems, or the pixel layer on one surface is an interference film system and the pixel layer on the other surface is a combination of color photosensitive resists; and each pixel layer is provided with a two-dimensional periodic structure, pixels in adjacent n wave bands belong to the same period and are repetitively arranged along the X-axis direction and the Y-axis direction of the surface of the filter until all working pixels of a detector are covered. The imaging spectrum filter has the advantages that since the pixel layers are decomposed on the two surfaces of the substrate, the number of layers of film systems in a pixel unit is decreased, the total thickness of the film systems is reduced and the structure is compact, the trap effect is effectively avoided; and since films are coated on the two surfaces of the substrate to enable the stress to be basically balanced, the substrate is not deformed, the coating accuracy is guaranteed, the time is reduced, the production efficiency is improved. Moreover, a unique ion beam sputtering double-sided coating machine design scheme and a unique magnetron sputtering double-sided coating machine design scheme are adopted.

Description

technical field [0001] The invention belongs to an optical filter, in particular to an imaging spectrum optical filter and its preparation technology. Background technique [0002] The core components of imaging spectroscopy system hardware include camera lenses, imaging spectral filters, and imaging detectors CMOS / CCD. Imaging lenses and imaging detectors have been industrialized, and there are many types of products available, so the design and manufacture of imaging spectral filters has become a key link in the hardware system. [0003] Imaging spectral filters usually may contain tens of thousands to hundreds of thousands of pixel elements, and the size ranges from a few microns to 20 microns, so it is unimaginable to use mechanical assembly to prepare them, but to use etching technology in semiconductors The method combined with the physical vapor deposition technology prepares pixel groups of various transmission bands on the same substrate. [0004] In order to prep...

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Problems solved by technology

[0009] 2 The stress effect of the film layer is large

[0016] This scheme can only produce broadband spectral characteristics

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