30results about How to "Simplify the film structure" patented technology

The invention provides a display panel and a manufacturing method thereof. The display panel comprises a substrate, a source / drain electrode, a light shielding layer, a dielectric layer and an oxide semiconductor layer. The oxide semiconductor layer is arranged on the dielectric layer and is connected with the source / drain electrode and the light shielding layer through a first via hole and a second via hole. The source / drain electrode and the light shielding layer are arranged on the same layer of the substrate, the source / drain electrode and the light shielding layer are simultaneously formed by etching the first metal layer and the dielectric layer is arranged on the substrate and covers the light shielding layer and the source / drain electrode layer so that that dielectric layer is enabled to have the function of the isolation layer, thereby reducing the number of the film layers of the display panel, simplifying the film layer structure of the display panel, simultaneously reducingthe processes required for production and the use number of the mask plate, improving the production efficiency and reducing the production cost.

The invention provides a display device, a display substrate thereof, and a manufacturing method of the display substrate. The display substrate includes a light-transmitting substrate and a plurality of first sub-pixels; each first sub-pixel includes a first electrode, a first pixel definition layer, a first sub-pixel A first luminescent material layer and a second electrode in the opening of the pixel definition layer; the first pixel definition layer has isolation columns for separating the second electrodes of the adjacent first sub-pixels; the isolation columns are T-shaped, T-shaped The isolation column is an integral molding structure. Because the partition part is long, the T-shaped isolation column has a good automatic partition effect on the vapor-deposited conductive material layer; the T-shaped isolation column is integrally formed and has a single-layer structure. The partition part and the support part have the same material, and the pattern is realized in the same process Therefore, the bonding effect between the partition part and the support part is good, there is no delamination phenomenon, and the performance is reliable.

The invention relates to an imaging spectrum filter, which comprises a substrate and pixel layers. The imaging spectrum filter is characterized in that the front surface and the back surface of the substrate are covered by the pixel layers, and the pixel layers on the front surface and the back surface are interference film systems, or the pixel layer on one surface is an interference film system and the pixel layer on the other surface is a combination of color photosensitive resists; and each pixel layer is provided with a two-dimensional periodic structure, pixels in adjacent n wave bands belong to the same period and are repetitively arranged along the X-axis direction and the Y-axis direction of the surface of the filter until all working pixels of a detector are covered. The imaging spectrum filter has the advantages that since the pixel layers are decomposed on the two surfaces of the substrate, the number of layers of film systems in a pixel unit is decreased, the total thickness of the film systems is reduced and the structure is compact, the trap effect is effectively avoided; and since films are coated on the two surfaces of the substrate to enable the stress to be basically balanced, the substrate is not deformed, the coating accuracy is guaranteed, the time is reduced, the production efficiency is improved. Moreover, a unique ion beam sputtering double-sided coating machine design scheme and a unique magnetron sputtering double-sided coating machine design scheme are adopted.

A top-emitting organic electroluminescent display panel, a manufacturing method, and a display device. The top-emitting organic electroluminescent display panel comprises: a substrate, a layer of white organic light emitting diodes and a thin film encapsulation layer arranged on the substrate in sequence. The thin film encapsulation layer comprises at least two inorganic thin film layers and at least one organic thin film layer. At least one organic thin film layer is a color filter layer, the color filter layer being arranged between the at least two inorganic thin film layers. Since one of the organic thin film layers in the thin film encapsulation layer is a color filter layer, the color filter layer does not have to be arranged above the thin film encapsulation layer separately, thus reducing the number of film layers, simplifying the film layer structure, reducing manufacturing costs, and improving the luminous efficiency and the display effect.

The invention discloses an infrared waveband diaphragm composite membrane and a preparation method as well as a composite material, belonging to the technical field of manufacturing of optical thin films. The infrared waveband diaphragm composite membrane has a double-layer membrane structure; the first layer is a hafnium oxide membrane layer and the second layer is a chromium membrane layer; the first layer and the second layer have strong bonding force with a calcium fluoride base; and the inner stress is small and the manufacturability of an infrared diaphragm prepared by a photographing copying method is good. According to the preparation method of the infrared waveband diaphragm layer, the hafnium oxide membrane layer and the chromium membrane layer are plated by adopting an evaporation manner and the chromium membrane layer is plated by two times so that the diaphragm prepared by adopting the photographing copying method has flat and smooth lines and have no light-transmitting point; and the preparation method has a simple technological process, is easy to operate and is suitable for industrial popularization and application. A base material of the infrared waveband diaphragm composite material is calcium fluoride, the inner layer membrane is the hafnium oxide membrane layer and the outer layer is the chromium membrane layer; and the bonding capability of the chromium membrane layer and calcium fluoride is strong and the process performance is good.