Infrared band diaphragm composite film, preparation method and composite material

An infrared band and composite film technology, which is applied in chemical instruments and methods, metal material coating technology, ion implantation plating, etc., can solve the problems of easy cracking and falling off of the film layer, poor bonding ability, and rough lines, etc., to achieve Good environmental adaptability and chemical stability, reducing internal stress and avoiding cracking and falling off

Active Publication Date: 2017-02-08
LUOYANG INST OF ELECTRO OPTICAL EQUIP OF AVIC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The combination ability of crystal materials and most coating materials is poor. The film layer used for the infrared band diaphragm is thick and the stress is large. The coated film layer is easy to crack and fall off. There are many light transmission points when making the diaphragm by the photocopying method in the later process. or rough lines

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0026] In this embodiment, the infrared band aperture composite film has a double-layer film structure, the first film material is hafnium dioxide, the first film thickness is 50nm, the second film material is chromium, and the second film thickness is 600nm.

[0027] The equipment used in this embodiment is an E-beam evaporation source, an ion bombardment device, and a quartz crystal control unit.

[0028] The preparation method of the infrared band diaphragm composite film in this embodiment, the specific operation steps are as follows:

[0029] 1. Prepare

[0030] 1) Clean the vacuum chamber, coating fixture, evaporation source baffle and ion bombardment source;

[0031] 2) Fill the two film materials of hafnium dioxide and chromium into the electron gun crucible respectively;

[0032] 3) Replace the quartz crystal piece;

[0033] 4) Compile and debug the coating program.

[0034] 2. Clean parts

[0035] 1) Clean the surface of the parts with absorbent cotton dipped in...

Embodiment 2

[0048] In this embodiment, the infrared band aperture composite film has a double-layer film structure, the first film material is hafnium dioxide, the second film thickness is 60nm, the outer film material is chromium, and the outer film thickness is 600nm.

[0049] The equipment used in this embodiment is a resistance evaporation source, an ion bombardment device, and a quartz crystal control unit.

[0050] The preparation method of the infrared band diaphragm composite film in this embodiment, the specific operation steps are as follows:

[0051] 1. Prepare

[0052] 1) Clean the vacuum chamber, coating fixture, evaporation source baffle and ion bombardment source;

[0053] 2) Fill the hafnium dioxide and chromium film materials into the resistance evaporation source crucible respectively;

[0054] 3) Replace the quartz crystal piece;

[0055] 4) Compile and debug the coating program.

[0056] 2. Clean parts

[0057] 1) Clean the surface of the parts with absorbent cott...

Embodiment 3

[0070] In this embodiment, the infrared band aperture composite film has a double-layer film structure. The material of the first layer is hafnium dioxide, the thickness of the first layer is 55nm, the material of the second layer is chromium, and the thickness of the second layer is 600nm.

[0071] The equipment used in this embodiment is an E-beam evaporation source, an ion bombardment device, and a quartz crystal control unit.

[0072] The preparation method of the infrared band diaphragm composite film in this embodiment, the specific operation steps are as follows:

[0073] 1. Prepare

[0074] 1) Clean the vacuum chamber, coating fixture, evaporation source baffle and ion bombardment source;

[0075] 2) Fill the two film materials of hafnium dioxide and chromium into the electron gun crucible respectively;

[0076] 3) Replace the quartz crystal piece;

[0077] 4) Compile and debug the coating program.

[0078] 2. Clean parts

[0079] 1) Clean the surface of the parts...

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Abstract

The invention discloses an infrared waveband diaphragm composite membrane and a preparation method as well as a composite material, belonging to the technical field of manufacturing of optical thin films. The infrared waveband diaphragm composite membrane has a double-layer membrane structure; the first layer is a hafnium oxide membrane layer and the second layer is a chromium membrane layer; the first layer and the second layer have strong bonding force with a calcium fluoride base; and the inner stress is small and the manufacturability of an infrared diaphragm prepared by a photographing copying method is good. According to the preparation method of the infrared waveband diaphragm layer, the hafnium oxide membrane layer and the chromium membrane layer are plated by adopting an evaporation manner and the chromium membrane layer is plated by two times so that the diaphragm prepared by adopting the photographing copying method has flat and smooth lines and have no light-transmitting point; and the preparation method has a simple technological process, is easy to operate and is suitable for industrial popularization and application. A base material of the infrared waveband diaphragm composite material is calcium fluoride, the inner layer membrane is the hafnium oxide membrane layer and the outer layer is the chromium membrane layer; and the bonding capability of the chromium membrane layer and calcium fluoride is strong and the process performance is good.

Description

technical field [0001] The invention belongs to the technical field of optical thin film manufacturing, and in particular relates to an infrared band diaphragm composite film, a preparation method and a composite material. Background technique [0002] Optical film is an indispensable part of many modern optical components and optical systems, and its quality directly affects the performance of optical film components and optical systems. Among optical thin film materials, hafnium dioxide is one of the most commonly used high refractive index thin film materials used in laser system optical devices. It has a wide transparent region from ultraviolet to infrared, and also has good thermal and chemical stability. properties, good optical and mechanical properties and high laser damage threshold, so it is often used in the case of anti-laser damage film, and has a wide range of applications in high-power laser systems, and hafnium dioxide film also has a relatively Higher diele...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B32B9/04B32B15/00C23C14/08C23C14/18
CPCB32B9/041C23C14/083C23C14/18
Inventor 吴俊儒刘凤玉刘佳琳陈小鹏
Owner LUOYANG INST OF ELECTRO OPTICAL EQUIP OF AVIC
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