Infrared band diaphragm composite film, preparation method and composite material
An infrared band and composite film technology, which is applied in chemical instruments and methods, metal material coating technology, ion implantation plating, etc., can solve the problems of easy cracking and falling off of the film layer, poor bonding ability, and rough lines, etc., to achieve Good environmental adaptability and chemical stability, reducing internal stress and avoiding cracking and falling off
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Embodiment 1
[0026] In this embodiment, the infrared band aperture composite film has a double-layer film structure, the first film material is hafnium dioxide, the first film thickness is 50nm, the second film material is chromium, and the second film thickness is 600nm.
[0027] The equipment used in this embodiment is an E-beam evaporation source, an ion bombardment device, and a quartz crystal control unit.
[0028] The preparation method of the infrared band diaphragm composite film in this embodiment, the specific operation steps are as follows:
[0029] 1. Prepare
[0030] 1) Clean the vacuum chamber, coating fixture, evaporation source baffle and ion bombardment source;
[0031] 2) Fill the two film materials of hafnium dioxide and chromium into the electron gun crucible respectively;
[0032] 3) Replace the quartz crystal piece;
[0033] 4) Compile and debug the coating program.
[0034] 2. Clean parts
[0035] 1) Clean the surface of the parts with absorbent cotton dipped in...
Embodiment 2
[0048] In this embodiment, the infrared band aperture composite film has a double-layer film structure, the first film material is hafnium dioxide, the second film thickness is 60nm, the outer film material is chromium, and the outer film thickness is 600nm.
[0049] The equipment used in this embodiment is a resistance evaporation source, an ion bombardment device, and a quartz crystal control unit.
[0050] The preparation method of the infrared band diaphragm composite film in this embodiment, the specific operation steps are as follows:
[0051] 1. Prepare
[0052] 1) Clean the vacuum chamber, coating fixture, evaporation source baffle and ion bombardment source;
[0053] 2) Fill the hafnium dioxide and chromium film materials into the resistance evaporation source crucible respectively;
[0054] 3) Replace the quartz crystal piece;
[0055] 4) Compile and debug the coating program.
[0056] 2. Clean parts
[0057] 1) Clean the surface of the parts with absorbent cott...
Embodiment 3
[0070] In this embodiment, the infrared band aperture composite film has a double-layer film structure. The material of the first layer is hafnium dioxide, the thickness of the first layer is 55nm, the material of the second layer is chromium, and the thickness of the second layer is 600nm.
[0071] The equipment used in this embodiment is an E-beam evaporation source, an ion bombardment device, and a quartz crystal control unit.
[0072] The preparation method of the infrared band diaphragm composite film in this embodiment, the specific operation steps are as follows:
[0073] 1. Prepare
[0074] 1) Clean the vacuum chamber, coating fixture, evaporation source baffle and ion bombardment source;
[0075] 2) Fill the two film materials of hafnium dioxide and chromium into the electron gun crucible respectively;
[0076] 3) Replace the quartz crystal piece;
[0077] 4) Compile and debug the coating program.
[0078] 2. Clean parts
[0079] 1) Clean the surface of the parts...
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Abstract
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