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Pretreatment process for aluminum and high etch cleaner used therein

A cleaning agent and etching technology, applied in chemical instruments and methods, detergent compositions, non-surface active detergent compositions, etc.

Active Publication Date: 2012-09-19
HENKEL KGAA
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Although attempts have been made to reduce filiform corrosion, they have not been entirely successful and there is a need for improved resistance to filiform corrosion, particularly in zirconium-based coatings, and coatings on aluminum alloys typically having copper levels greater than or equal to 0.5 wt%. layer

Method used

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  • Pretreatment process for aluminum and high etch cleaner used therein
  • Pretreatment process for aluminum and high etch cleaner used therein
  • Pretreatment process for aluminum and high etch cleaner used therein

Examples

Experimental program
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Embodiment

[0026] In the first series of tests, standard cleaners were modified to have reduced levels of silicates, the pH was changed, and the level of EDTA was changed. A standard cleaner was prepared by adding to water 26.0 g / L of a composition comprising 50% by weight deionized water, 46.97% by weight potassium hydroxide, and 3.03% by weight sodium trimetaphosphate. The standard cleaner also includes 1.6 g / l of surfactant and 0.3 g / l of sodium gluconate. Sodium bicarbonate was used to adjust the pH of the detergent solution. Standard cleaners were modified by adjusting the sodium silicate and EDTA levels and by adjusting the pH as shown in Table 3 below. The substrate was ACT aluminum alloy 6022 with a copper level of 0.01-0.11 wt%. The substrates were treated for etching studies as follows: the substrates were initially cleaned with an acetone dip; the cleaner was applied for 120 seconds; followed by a warm water rinse and the plates were allowed to dry. The aluminum loss due to...

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Abstract

Disclosed is a high etch cleaner for aluminum and aluminum alloy substrates that leads to enhanced corrosion protective performance of a variety of anti-corrosion pretreatments. The cleaner comprises very low levels of silicate of from 0 to 250 ppm, 50 to 500 ppm of at least one chelator selected from EDTA or its salts, NTA or its salts, DTPA or its salts, iminodisuccinic acid or its salts, EDDS or its salts, tartaric acid or its salts, or a mixture thereof, and has a high pH of from 11.0 to 13.5. Preferably the cleaner is used to etch from 0.5 to 4.0 grams per meter squared from the substrates.; Substrates treated with the cleaner and then coated with a variety of anti-corrosion pretreatments and outer coatings show enhanced corrosion resistance compared to substrates cleaned with standard cleaners that have low etch rates, high silicate levels and no chelating agents followed by anti-corrosion pretreatments and outer coatings.

Description

[0001] This application claims priority to US Provisional Application Serial No. 61 / 290,279, filed December 28, 2009. technical field [0002] The present invention relates generally to the cleaning of aluminum-based substrates prior to the application of anti-corrosion pretreatments, and more particularly, the present invention relates to cleaners that produce high etch rates on aluminum-based substrates that enable subsequent application of anti-corrosion Enhanced corrosion protection properties of pretreatment coatings. Background technique [0003] Anti-corrosion pretreatment coatings are often applied to metal substrates prior to the application of exterior decorative or protective coatings, especially if the substrate is exposed to the elements being used. These pretreatment coatings are designed to minimize corrosion of metal substrates if and when the substrate is exposed to moisture and oxygen. A common metal substrate includes aluminum or an aluminum alloy. These...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23F1/20C23F17/00
CPCC11D7/06C23C22/78C11D7/3245C23G1/22C11D7/265C11D11/0029C23F1/36C11D2111/16
Inventor E·卡皮克M·斯恩科斯基B·H·古德雷奥S·科纳恩
Owner HENKEL KGAA
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