Patents
Literature
Patsnap Copilot is an intelligent assistant for R&D personnel, combined with Patent DNA, to facilitate innovative research.
Patsnap Copilot

105 results about "Iminodisuccinic acid" patented technology

Cleanout fluid applicable to cleaning of clinical laboratory instruments and preparation method

The invention discloses cleanout fluid applicable to cleaning of clinical laboratory instruments. The cleanout fluid is composed of, by mass, 81-90% of water, 2-4% of a surface active agent, 2-5% of an inorganic auxiliary agent, 1-2% of a solubilizing agent, 1-2% of lubrication rust inhibitor, 0.5-1% of a sterilizing agent and 2-5% of a green chelating agent. The preparation method of the cleanout fluid includes the steps that firstly, pure water is added into a container, then the surface active agent, the inorganic auxiliary agent, the solubilizing agent, the lubrication rust inhibitor, the sterilizing agent and the green chelating agent are sequentially added, the mixture is mixed and stirred to be uniform, and the cleanout fluid is obtained. According to the cleanout fluid, due to the fact that the added iminodisuccinic acid is a brand-new green chelating agent, the cleanout fluid has biodegradability and is safe and environmentally friendly; due to the fact that a compounded mixed surfactant system of the surface active agent sodium dodecyl benzene sulfonate, the inorganic auxiliary agent and the solubilizing agent is added, the cleanout fluid has good oil stain removal capacity and is low in foam output and easy to clean; due to the fact that rust prevention brightener methyl silicone oil is added, the cleanout fluid achieves rust prevention, maintenance and brightening effects on the instruments.
Owner:王芳

Sapphire polishing solution with high surface evenness, and polishing technology thereof

InactiveCN108485532AMeet the requirements of high polishing removal rateMeet the requirements of polishing removal ratePolishing compositions with abrasivesEthylenediamineHigh surface
The invention relates to a sapphire polishing solution with the high surface evenness, and a polishing technology thereof. The sapphire polishing solution with the high surface evenness is prepared from a rough polishing solution and a finish polishing solution, wherein the rough polishing solution is prepared from the following components in percentage by weight: 20 to 50 percent of alumina nanoparticle, 3 to 10 percent of sodium methylate, 0.1 to 1 percent of disodium methylene dinaphthalenesulfonate, 0.5 to 2 percent of sodium iminodisuccinate, and the balance of solvent; the finish polishing solution is prepared from the following components in percentage by weight: 20 to 50 percent of hydrophilic silicon dioxide nanoparticle, 0.1 to 1 percent of nonionic surfactant fatty alcohol-polyoxyethylene ether, 0.5 to 2 percent of sodium polyacrylate, 0.2 to 1.5 percent of hydroxyethyl ethylenediamine, and the balance of solvent. The sapphire polishing solution with the high surface evenness provided by the invention not only can meet the requirement on a high polishing removal rate, but also can form a sapphire surface with high evenness and ultralow roughness; the polishing solution is low in cost, a polishing process is easy to control, the production yield is high, and the product quality is stable; a polishing method of combining the rough polishing and the finish polishing canbe used, so that not only can fast production with a high removal rate be realized, but also the precision polishing requirements on high evenness and low surface roughness can be met.
Owner:江苏金琥珀光学科技股份有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products