209results about How to "Prevent redeposition" patented technology

Fluid producing or injecting wells may be treated with a water-in-oil emulsion for the removal or inhibition of unwanted particulates, including pipe dope, asphaltenes and paraffins. In addition, such emulsions are effective in the displacement of oil base drilling muds and / or residues from such muds from wells. The emulsion may also be used to break the interfacial and / or rheological properties of oil base mud and synthetic oil base mud filter cakes, and act as a demulsifier to break the water-in-oil emulsion present in such oil base and synthetic oil base muds. The water-in-oil emulsions may optionally contain a dispersing agent as well as a surfactant.

The present invention is a method, process and apparatus for selective cleaning, drying, and modifying substrate surfaces and depositing thin films thereon using a dense phase gas solvent and admixtures within a first created supercritical fluid anti-solvent. Dense fluids are used in combination with sub-atmospheric, atmospheric and super-atmospheric plasma adjuncts (cold and thermal plasmas) to enhance substrate surface cleaning, modification, precision drying and deposition processes herein. Moreover, conventional wet cleaning agents such as hydrofluoric acid and ammonium fluoride may be used with the present invention to perform substrate pre-treatments prior to precision drying and cleaning treatments described herein. Finally, dense fluid such as solid phase carbon dioxide and argon may be used as a follow-on treatment or in combination with plasmas to further treat a substrate surface.

The invention discloses a multipurpose high solid content paste washing agent for cleaning heavy oil stain on hard surfaces of tablewares, a cooking bench, tiles, ceramic utensils, a range hood and the like in a kitchen and a preparation method thereof. The multipurpose high solid content paste washing agent comprises the following ingredients: a nonionic surfactant, an anionic surfactant, an ampholytic surfactant, a humectant, a detergent auxiliary, carbonate, a forming agent and the like. The paste washing agent is obtained by the procedures of stirring, grinding and filling, and the like. The solid content of the paste washing agent is more than or equal to 70 percent. The paste washing agent occupies small volume and is convenient to carry. Packing materials are saved. The detergency is strong. After the paste washing agent is dissolved or dispersed in water, little foam is generated. The wetting power is strong. The paste washing agent has effects of rapidly dispersing, permeating, emulsifying and washing the oil stain and can be widely used for cleaning the oil stain on the hard surfaces of the tablewares, the cooking bench, the tiles, the ceramic utensils, the range hood and the like in the kitchen.

Fluid producing or injecting wells may be treated with a water-in-oil emulsion for the removal or inhibition of unwanted particulates, including pipe dope, asphaltenes and paraffins. In addition, such emulsions are effective in the displacement of oil base drilling muds and / or residues from such muds from wells. The emulsion may also be used to break the interfacial and / or rheological properties of oil base mud and synthetic oil base mud filter cakes, and act as a demulsifier to break the water-in-oil emulsion present in such oil base and synthetic oil base muds. The water-in-oil emulsions may optionally contain a dispersing agent as well as a surfactant.

A composition for the stripping of photoresist and the cleaning of residues from substrates, and for silicon oxide etch, comprising from about 0.01 percent by weight to about 10 percent by weight of one or more fluoride compounds, from about 10 percent by weight to about 95% by weight of a sulfoxide or sulfone solvent, and from about 20 percent by weight to about 50 percent by weight water. The composition may contain corrosion inhibitors, chelating agents, co-solvents, basic amine compounds, surfactants, acids and bases.

The invention relates to a plugging removal and stimulation method for a low permeability oil well. The ultra-low resistance acid-type microemulsion is prepared by the following components: 10%-25% of acid, 5%-20% of oil, 5%-25% of alcohol, 0.5%-5% of surfactant, 0.5%-3% of inorganic salt, 0.3-1.5% of corrosion inhibitor and the balance water. The method comprises the following steps: injecting the prepared microemulsion in the oil bearing reservoir of the oil well, closing the oil well to react for 4-10h, cleaning the oil well, flowing the reaction exhaust liquor back, and completing the oilwell to perform normal production. The ultra-low resistance acid-type microemulsion used by the invention has thermodynamic stability, is a high dispersive acid-type microemulsion with good solubilization capacity, has ultra-low surface and interfacial tensions and good solubilization capacity and can increase the dispersive capacity of crude in water and the emulsification and peeling function to oil film; the microemulsion also has good dissolubility in water or oil and good fluidity due to high carrying capability and low seepage resistances so that the oil yield of the oil well is increased and the water content is reduced; the liquid surface tension in oil reservoir is reduced and the flow resistance of the crude is lowered so that the mining rate of the crude is increased and the plugging removal and stimulation of the oil well can be realized.

A method and cluster tool for selectively removing contaminating particles from a substrate surface using a laser. An inspection tool scans the substrate surface to detect and identify any defects on the substrate surface, and then suitable software analyzes the scanned data to determine characteristics of the defect including the type of defect, the number of defects, sizes of each defect and the planar x, y coordinates of each defect. This data is used to command a laser tool to remove only those defects identified as contaminants that are capable of being removed from the surface of the substrate and may be detrimental to subsequent substrate processing techniques. The laser contacts this identified contaminant at its x, y coordinates to remove only such contaminant while not substantially treating or directly contacting the area surrounding the contaminant, thereby preventing damaging or altering the substrate surface.

Fluid producing wells may be treated with a water-in-oil emulsion for the removal or inhibition of unwanted solid particulates, including pipe dope, asphaltenes and paraffins. Such emulsions are of particular applicability in the displacement of oil base drilling muds and / or residues from such muds from producing wells. The water-in-oil emulsions may optionally contain a dispersing agent as well as a surfactant.

Fluid producing wells may be treated with a water-in-oil emulsion for the removal or inhibition of unwanted solid particulates, including pipe dope, asphaltenes and paraffins. Such emulsions are of particular applicability in the displacement of oil base drilling muds and / or residues from such muds from producing wells. The water-in-oil emulsions may optionally contain a dispersing agent as well as a surfactant.

Incorporating dirt-attracting polycationic polymers, such as polyethyleneimines, into cleaning wipes, mop pads, and similar substrates, improves dirt pick-up and retards redeposition of the dirt back onto the cleaned surface. The polymers can be incorporated directly into the non-woven substrates or they can be formulated with a cleaning composition for use with the substrate. The substrate containing the dirt-attracting polycationic polymers can be employed to clean hard and soft surfaces. The presence of the dirt-attracting polycationic polymers also facilitates biocide release from the substrates.

A cleaning solution for removing copper complex residues from the surface of polishing pads and wafer substrates includes an amine pH-adjusting agent, which can be a unidentate or bidentate amine compound or a quartnary ammonium hydroxide compound or an amine including an alcohol group. The cleaning solution also includes an amino acid complexing agent and an inhibitor. In a preferred embodiment, the cleaning solution has a basic pH.

An improved method for laser processing that prevents material redeposition during laser ablation but allows material to be removed at a high rate. In a preferred embodiment, laser ablation is performed in a chamber filled with high pressure precursor (etchant) gas so that sample particles ejected during laser ablation will react with the precursor gas in the gas atmosphere of the sample chamber. When the ejected particles collide with precursor gas particles, the precursor is dissociated, forming a reactive component that binds the ablated material. In turn, the reaction between the reactive dissociation by-product and the ablated material forms a new, volatile compound that can be pumped away in a gaseous state rather than redepositing onto the sample.

The present invention is based in part on the discovery that impregnating a cleaning substrate with a nonionic, linear polymer unexpectedly improves the cleaning efficacy of the article and prevents redeposition of soil and dirt onto the cleaned hard or soft surface. The nonionic, linear polymer is, for example, polyacrylamide. In addition, a method of incorporation of a cleaning composition into said substrate is disclosed.

The invention discloses a mechanical equipment cleaning liquid, which consists of monohydric alcohol, glycol, complexing agent, anionic surfactant, nonionic surfactant, compound corrosion inhibitor, coloring agent and water. The mechanical equipment cleaning liquid is prepared by using environmental-friendly substances, is a universal cleaning fluid for mechanical equipment maintenance and repair, does not have inflammables and explosive characteristics during use, does not cause higher adverse influences on a working environment, does not contain environmentally hazardous substances such as nitrite, phenol and formaldehyde, is nonflammable, is nontoxic to operators and has a better effect of cleaning inorganic fouling such as asphalt, better safety and environmental friendliness are realized, the processing environment and sanitary conditions can be improved, the working efficiency can be improved and the cost can be reduced.

In the bevel etching apparatus relating to the present invention, a substrate is inserted between electrically connected electrodes. A high-frequency power source is connected to the electrodes, and ground potential is applied to a support unit that supports the substrate. Gas (atmosphere) is supplied to the gap between the electrodes and the application of the high-frequency electric power to the electrodes causes the generation of atmospheric-pressure glow discharge between the electrode and the substrate. Bevel etching is performed by rotating the substrate along the circumferential direction in this condition. According to this construction, the bevel etching can be simultaneously performed to the front surface, the rear surface and the side of the substrate without causing any configuration change in the substrate.

A method for cleaning a substrate is provided that includes applying a liquid medium to a surface of the substrate such that the liquid medium substantially covers a portion of the substrate that is being cleaned. One or more transducers are used to generate acoustic energy. The generated acoustic energy is applied to the substrate and the liquid medium meniscus such that the applied acoustic energy to the liquid medium prevents cavitation within the liquid medium. The acoustic energy applied to the substrate provides maximum acoustic wave displacement to acoustic waves introduced into the liquid medium. The acoustic energy introduced into the substrate and the liquid medium enables dislodging of the particle contaminant from the surface of the substrate. The dislodged particle contaminants become entrapped within the liquid medium and are carried away from the surface of the substrate by the liquid medium.

The invention provides a method for improving the damage threshold of a fused quartz optical element. The method comprises the following steps of: performing cleaning, rinsing and spray cleaning on the fused quartz optical element by using a mixed solution including a cleaning agent micro-90 and water; and performing etching, rinsing and spray cleaning on the fused quartz optical element through a hydrofluoric acid aqueous solution. In the whole cleaning process, 40-270 kHz of multi-frequency ultrasonic waves are introduced for cleaning. The method provided by the invention can effectively passivate scratches in a sub-surface damage layer of the fused quartz optical element, and remove polishing scraps and polishing impurities in the scratches with different scales to stabilize a hydrofluoric acid etching process, prevent re-deposition of an etching byproduct, and stably promote the damage threshold of the element sharply.

CMP formulations for use on nickel / phosphorus alloys comprising abrasive particles and an oxidant, a modifier for the action of the oxidant and first and second accelerants to sequester removed materials containing phosphonate and ammonium or amine groups respectively and optionally an organic carboxylic acid.

The invention discloses a cleaning agent for filth on surface of a room temperature vulcaniza-tion (RTV) coating insulator. The cleaning agent is formed by mixing at least two of ethylene diamine tetraacetic acid, sodium glycollate, sodium oxalate and sodium gluconate, sodium polyacrylate, hydroxyethylidene phosphonic acid disodium, alkylphenol ethoxylates serving as a surfactant, fatty alcohol-polyoxyethylene ether serving as a penetrant and water. When the cleaning agent is used, the filth on the surface of the RTV coating insulator is cleaned through combined action of mechanisms such as permeation, complexation, dispersion and expansion. Therefore, the cleaning agent has the advantages of being low in cost, simple in operation, convenient to implement, complete in filth removing, freeof damage to RTV coating and corrosion to metal parts of an insulator pillar and favorable for wide popularization.

An air conditioner having a main body is provided with a panel (1001) including a front panel (1001a) a and a top panel (1001b), the main body incorporating an air passage connecting an air inlet (1002) and an air outlet (1003) , an air filter (1004), a heat exchanger (1005), a blower fan (1006), and a dedusting device (1007) attached to the front face of the air filter (1004) which is reciprocated along the surface of the air filter (1004), the top panel (1001b) is opened / closed as the dedusting device (1007) is reciprocated.

The alkaline water-base cutting liquid for silicon wafer and other semiconductor material consists of polyglycol of molecular weight 200-1000 in 30-90 weight portions, pH regulator 9-30 weight portions, chelating agent 1-10 weight portions and deionized water for the rest. The present invention has the beneficial effects of homogeneous stable chemical splitting effect coexisting with the mechanical effect, less stress, lowered damage of the semiconductor material, raised chip cutting efficiency and quality, simple post-treatment, and avoiding the chemical bonding and adsorption on the surface of silicon wafer.

The invention relates to an airplane skin external surface cleaning compound. The airplane skin external surface cleaning compound comprises a surfactant, a chelating agent, a corrosion inhibitor, inorganic base and a solvent. The airplane skin external surface cleaning compound comprises the following components by mass percentage: 18-34% of the surfactant, 8-13% of the complexing agent, 5-9% of the corrosion inhibitor, 3-8% of the inorganic base, and the balance of the solvent. The cleaning compound employs a complex formulation technology, the components ratio is reasonable, a pollutant deposited on the airplane skin external surface is thoroughly cleaned, effect is good, efficiency is high, the cost of the cleaning compound is low, no corrosion is generation on a body of the airplane, no pollution is generated on human body and environment, the cleaning waste liquid can be directly discharged, and the cleaning compound has the advantages of safety and environmental friendliness.

The invention relates to a cleaning agent and more particularly relates to a metal cleaning agent and a preparation method thereof. By adoption of the preparation method, the problem of longer preparation time needed by the existing cleaning agent. The metal cleaning agent is prepared from the following components in parts by weight: 10-18 parts of washing assistant, 4-15 parts of surface active agent, 0.2-0.8 part of solubilizing agent, 1-1.5 parts of corrosion inhibitor, 0.2-0.5 part of antirust agent, 1-2 parts of complexing agent, 0.2-0.8 part of preservative, 0.5-1.5 parts of antistatic agent and 0.5-1 part of organic silicon defoamer, and also comprises water for dissolving the components. The metal cleaning agent and the preparation method has the beneficial effects that the neededpreparation time is short, and the prepared cleaning agent has the advantages of strong cleaning effect and fast cleaning speed.

A nonaqueous magnetorheological fluid includes a primarily organic carrier liquid and magnetizable particles. The magnetorheological fluid also includes a buffer, a stabilizer, and water. A pH of the magnetorheological fluid is between 6.5 and 9.0.

CMP formulations for use on nickel / phosphorus alloys comprising abrasive particles and an oxidant, a modifier for the action of the oxidant and first and second accelerants to sequester removed materials containing phosphonate and ammonium or amine groups respectively and optionally an organic carboxylic acid.

A system for analyzing a thin film uses an energy beam, such as a laser beam, to remove a portion of a contaminant layer formed on the thin film surface. This cleaning operation removes only enough of the contaminant layer to allow analysis of the underlying thin film, thereby enhancing analysis throughput while minimizing the chances of recontamination and / or damage to the thin film. An energy beam source can be readily incorporated into a conventional thin film analysis tool, thereby minimizing total analysis system footprint. Throughput can be maximized by focusing the probe beam (or probe structure) for the analysis operation at the same location as the energy beam so that repositioning is not required after the cleaning operation. Alternatively, the probe beam (structure) and the energy beam can be directed at different locations to reduce the chances of contamination of the analysis optics.