207results about How to "Prevent redeposition" patented technology

The invention discloses a multipurpose high solid content paste washing agent for cleaning heavy oil stain on hard surfaces of tablewares, a cooking bench, tiles, ceramic utensils, a range hood and the like in a kitchen and a preparation method thereof. The multipurpose high solid content paste washing agent comprises the following ingredients: a nonionic surfactant, an anionic surfactant, an ampholytic surfactant, a humectant, a detergent auxiliary, carbonate, a forming agent and the like. The paste washing agent is obtained by the procedures of stirring, grinding and filling, and the like. The solid content of the paste washing agent is more than or equal to 70 percent. The paste washing agent occupies small volume and is convenient to carry. Packing materials are saved. The detergency is strong. After the paste washing agent is dissolved or dispersed in water, little foam is generated. The wetting power is strong. The paste washing agent has effects of rapidly dispersing, permeating, emulsifying and washing the oil stain and can be widely used for cleaning the oil stain on the hard surfaces of the tablewares, the cooking bench, the tiles, the ceramic utensils, the range hood and the like in the kitchen.

Fluid producing or injecting wells may be treated with a water-in-oil emulsion for the removal or inhibition of unwanted particulates, including pipe dope, asphaltenes and paraffins. In addition, such emulsions are effective in the displacement of oil base drilling muds and/or residues from such muds from wells. The emulsion may also be used to break the interfacial and/or rheological properties of oil base mud and synthetic oil base mud filter cakes, and act as a demulsifier to break the water-in-oil emulsion present in such oil base and synthetic oil base muds. The water-in-oil emulsions may optionally contain a dispersing agent as well as a surfactant.

Fluid producing wells may be treated with a water-in-oil emulsion for the removal or inhibition of unwanted solid particulates, including pipe dope, asphaltenes and paraffins. Such emulsions are of particular applicability in the displacement of oil base drilling muds and/or residues from such muds from producing wells. The water-in-oil emulsions may optionally contain a dispersing agent as well as a surfactant.

Incorporating dirt-attracting polycationic polymers, such as polyethyleneimines, into cleaning wipes, mop pads, and similar substrates, improves dirt pick-up and retards redeposition of the dirt back onto the cleaned surface. The polymers can be incorporated directly into the non-woven substrates or they can be formulated with a cleaning composition for use with the substrate. The substrate containing the dirt-attracting polycationic polymers can be employed to clean hard and soft surfaces. The presence of the dirt-attracting polycationic polymers also facilitates biocide release from the substrates.

An improved method for laser processing that prevents material redeposition during laser ablation but allows material to be removed at a high rate. In a preferred embodiment, laser ablation is performed in a chamber filled with high pressure precursor (etchant) gas so that sample particles ejected during laser ablation will react with the precursor gas in the gas atmosphere of the sample chamber. When the ejected particles collide with precursor gas particles, the precursor is dissociated, forming a reactive component that binds the ablated material. In turn, the reaction between the reactive dissociation by-product and the ablated material forms a new, volatile compound that can be pumped away in a gaseous state rather than redepositing onto the sample.

The present invention is based in part on the discovery that impregnating a cleaning substrate with a nonionic, linear polymer unexpectedly improves the cleaning efficacy of the article and prevents redeposition of soil and dirt onto the cleaned hard or soft surface. The nonionic, linear polymer is, for example, polyacrylamide. In addition, a method of incorporation of a cleaning composition into said substrate is disclosed.

In the bevel etching apparatus relating to the present invention, a substrate is inserted between electrically connected electrodes. A high-frequency power source is connected to the electrodes, and ground potential is applied to a support unit that supports the substrate. Gas (atmosphere) is supplied to the gap between the electrodes and the application of the high-frequency electric power to the electrodes causes the generation of atmospheric-pressure glow discharge between the electrode and the substrate. Bevel etching is performed by rotating the substrate along the circumferential direction in this condition. According to this construction, the bevel etching can be simultaneously performed to the front surface, the rear surface and the side of the substrate without causing any configuration change in the substrate.

A method for cleaning a substrate is provided that includes applying a liquid medium to a surface of the substrate such that the liquid medium substantially covers a portion of the substrate that is being cleaned. One or more transducers are used to generate acoustic energy. The generated acoustic energy is applied to the substrate and the liquid medium meniscus such that the applied acoustic energy to the liquid medium prevents cavitation within the liquid medium. The acoustic energy applied to the substrate provides maximum acoustic wave displacement to acoustic waves introduced into the liquid medium. The acoustic energy introduced into the substrate and the liquid medium enables dislodging of the particle contaminant from the surface of the substrate. The dislodged particle contaminants become entrapped within the liquid medium and are carried away from the surface of the substrate by the liquid medium.

The invention provides a method for improving the damage threshold of a fused quartz optical element. The method comprises the following steps of: performing cleaning, rinsing and spray cleaning on the fused quartz optical element by using a mixed solution including a cleaning agent micro-90 and water; and performing etching, rinsing and spray cleaning on the fused quartz optical element through a hydrofluoric acid aqueous solution. In the whole cleaning process, 40-270 kHz of multi-frequency ultrasonic waves are introduced for cleaning. The method provided by the invention can effectively passivate scratches in a sub-surface damage layer of the fused quartz optical element, and remove polishing scraps and polishing impurities in the scratches with different scales to stabilize a hydrofluoric acid etching process, prevent re-deposition of an etching byproduct, and stably promote the damage threshold of the element sharply.

The invention discloses a cleaning agent for filth on surface of a room temperature vulcaniza-tion (RTV) coating insulator. The cleaning agent is formed by mixing at least two of ethylene diamine tetraacetic acid, sodium glycollate, sodium oxalate and sodium gluconate, sodium polyacrylate, hydroxyethylidene phosphonic acid disodium, alkylphenol ethoxylates serving as a surfactant, fatty alcohol-polyoxyethylene ether serving as a penetrant and water. When the cleaning agent is used, the filth on the surface of the RTV coating insulator is cleaned through combined action of mechanisms such as permeation, complexation, dispersion and expansion. Therefore, the cleaning agent has the advantages of being low in cost, simple in operation, convenient to implement, complete in filth removing, freeof damage to RTV coating and corrosion to metal parts of an insulator pillar and favorable for wide popularization.

An air conditioner having a main body is provided with a panel (1001) including a front panel (1001a) a and a top panel (1001b), the main body incorporating an air passage connecting an air inlet (1002) and an air outlet (1003) , an air filter (1004), a heat exchanger (1005), a blower fan (1006), and a dedusting device (1007) attached to the front face of the air filter (1004) which is reciprocated along the surface of the air filter (1004), the top panel (1001b) is opened/closed as the dedusting device (1007) is reciprocated.

The alkaline water-base cutting liquid for silicon wafer and other semiconductor material consists of polyglycol of molecular weight 200-1000 in 30-90 weight portions, pH regulator 9-30 weight portions, chelating agent 1-10 weight portions and deionized water for the rest. The present invention has the beneficial effects of homogeneous stable chemical splitting effect coexisting with the mechanical effect, less stress, lowered damage of the semiconductor material, raised chip cutting efficiency and quality, simple post-treatment, and avoiding the chemical bonding and adsorption on the surface of silicon wafer.

CMP formulations for use on nickel/phosphorus alloys comprising abrasive particles and an oxidant, a modifier for the action of the oxidant and first and second accelerants to sequester removed materials containing phosphonate and ammonium or amine groups respectively and optionally an organic carboxylic acid.

A system for analyzing a thin film uses an energy beam, such as a laser beam, to remove a portion of a contaminant layer formed on the thin film surface. This cleaning operation removes only enough of the contaminant layer to allow analysis of the underlying thin film, thereby enhancing analysis throughput while minimizing the chances of recontamination and/or damage to the thin film. An energy beam source can be readily incorporated into a conventional thin film analysis tool, thereby minimizing total analysis system footprint. Throughput can be maximized by focusing the probe beam (or probe structure) for the analysis operation at the same location as the energy beam so that repositioning is not required after the cleaning operation. Alternatively, the probe beam (structure) and the energy beam can be directed at different locations to reduce the chances of contamination of the analysis optics.