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Method for improving damage threshold of fused quartz optical element

An optical element and damage threshold technology, which is applied in the field of improving the damage threshold of fused silica optical components, can solve the problems of increasing the damage threshold, high cost, and no global processing of components, and achieves the effect of increasing the damage threshold and preventing redeposition.

Active Publication Date: 2013-12-18
LASER FUSION RES CENT CHINA ACAD OF ENG PHYSICS
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] However, the polishing process requires strict control of the technology, and the cost is high. When the damage threshold reaches a certain height, it is difficult to increase the damage threshold by improving the polishing process.
However, laser preprocessing does not have the ability to globally process components because it belongs to point processing.

Method used

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  • Method for improving damage threshold of fused quartz optical element

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0022] The chemical reagents, cleaning agent and ultrasonic equipment used in the present embodiment are as follows:

[0023] Micro-90 International Products CorporationCompany

[0024] Etching Solution = Electronic Grade HF: Electronic Grade NH 4 F:=1:2:4

[0025] Deionized water 18MΩ*cm

[0026] Ultrasonic cleaner is multiSONIK from Blackstone-NEY Ultrasonics TM generator Seven-frequency ultrasonic cleaning machine, the frequency is 40kHz, 80kHz, 120kHz, 140kHz, 170kHz, 220kHz, 270kHz

[0027] Immerse the fused silica optical element to be treated in micro-90: deionized water = 1:10 cleaning solution for 30 minutes, rinse with deionized water for 30 minutes, spray for 5 minutes; then immerse in the etching solution for 5 minutes, Rinse with deionized water for 90 minutes, then spray for 30 minutes, and let it dry naturally. The above cleaning, etching, and rinsing processes are all carried out in a thousand-class clean environment and a 40-270kHz ultrasonic cleaning mac...

Embodiment 2

[0029] This embodiment is the same as Embodiment 1, except that the etching time of the fused silica optical element in the etching solution is 60 minutes. The damage threshold test data is listed in Table 1 below.

Embodiment 3

[0031] This embodiment is the same as Embodiment 1, except that the etching time of the fused silica optical element in the etching solution is 120 minutes. The damage threshold test data is listed in Table 1 below.

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Abstract

The invention provides a method for improving the damage threshold of a fused quartz optical element. The method comprises the following steps of: performing cleaning, rinsing and spray cleaning on the fused quartz optical element by using a mixed solution including a cleaning agent micro-90 and water; and performing etching, rinsing and spray cleaning on the fused quartz optical element through a hydrofluoric acid aqueous solution. In the whole cleaning process, 40-270 kHz of multi-frequency ultrasonic waves are introduced for cleaning. The method provided by the invention can effectively passivate scratches in a sub-surface damage layer of the fused quartz optical element, and remove polishing scraps and polishing impurities in the scratches with different scales to stabilize a hydrofluoric acid etching process, prevent re-deposition of an etching byproduct, and stably promote the damage threshold of the element sharply.

Description

technical field [0001] The invention belongs to the technical field of optical element processing, and in particular relates to a method for increasing the damage threshold of fused silica optical elements. Background technique [0002] Fused silica is the most commonly used optical material in large-scale high-power laser systems. Fused silica materials are widely used in optical systems to prepare optical components such as lenses, windows, and shielding sheets. Under the action of strong laser light, the fused silica optical element is easily damaged. When the total area of ​​the damage points exceeds a certain percentage, the fused silica optical element will be considered completely damaged and cannot be used any longer. Fused silica optics are discontinued at the National Ignition Facility (NIF) when their area of ​​damage exceeds 3%. If the optical components undergo a series of cleaning before they are officially put into use, the service life of the components will...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C03C15/00
Inventor 叶鑫蒋晓东黄进刘红婕孙来喜周信达王凤蕊周晓燕耿锋
Owner LASER FUSION RES CENT CHINA ACAD OF ENG PHYSICS
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